⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL891965 | 0.73 | — | — | |
| SCHEMBL13914314 | 0.73 | — | — | |
| SCHEMBL2464961 | 0.73 | — | — | |
| SCHEMBL2579 | 0.72 | — | — | |
| SCHEMBL3410 | 0.69 | — | — | |
| SCHEMBL2468631 | 0.69 | — | — | |
| SCHEMBL197960 | 0.67 | — | — | |
| SCHEMBL2047109 | 0.67 | — | — | |
| Methylamine SCHEMBL10877320 | 0.67 | ALOX15 (0.32) | — | |
| SCHEMBL2461892 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2371912-B1 | Active radiation curable ink composition, ink composition for inkjet recording, printed matter, and method of producing molded article of printed matter | FUJIFILM CORP (JP) | 2014-04-30 | — | — | EP | disclosed |
| US-8573765-B2 | Active radiation curable ink composition, ink composition for inkjet recording, printed matter, and method of producing molded article of printed matter | FUJIFILM CORPORATION (JP) | 2013-11-05 | — | — | US | disclosed |
| CN-101196688-B | Photosensitive resin composition and spacer for liquid crystal panel | TOKYO OHKA KOGYO CO LTD | 2012-05-30 | — | — | CN | disclosed |
| US-20110241264-A1 | ACTIVE RADIATION CURABLE INK COMPOSITION, INK COMPOSITION FOR INKJET RECORDING, PRINTED MATTER, AND METHOD OF PRODUCING MOLDED ARTICLE OF PRINTED MATTER | FUJIFILM CORPORATION (JP) | 2011-10-06 | — | — | US | disclosed |
| EP-2371912-A1 | Active radiation curable ink composition, ink composition for inkjet recording, printed matter, and method of producing molded article of printed matter | Fujifilm Corporation (JP) | 2011-10-05 | — | — | EP | disclosed |
| CN-101196688-A | Photosensitive resin composition and spacer for liquid crystal panel | TOKYO OHKA KOGYO CO LTD (JP) | 2008-06-11 | — | — | CN | disclosed |
| US-5120637-A | Storage stability | FUJI PHOTO FILM CO., LTD. (JP) | 1992-06-09 | — | — | US | disclosed |
| EP-0362137-A2 | Molded polymers with hydrophilic surfaces, and process for making them | CIBA-GEIGY AG (CH) | 1990-04-04 | — | — | EP | disclosed |