Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | TP53 | P04637 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.43 |
| ▸ | THRB | P10828 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 4/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2459439 | 0.92 | ALDH1A1 (0.47) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL9722088 | 0.83 | ALDH1A1 (0.46) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| Ethylene Glycol SCHEMBL2459292 | 0.83 | TSHR (0.44) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL2184214 | 0.82 | TSHR (0.45) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL37396 | 0.82 | TSHR (0.45) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL183980 | 0.80 | TSHR (0.43) | ALDH1A1TP53CYP3A4HIF1ATSHR | |
| SCHEMBL1919847 | 0.80 | TSHR (0.43) | ALDH1A1TP53CYP3A4HIF1ATSHR | |
| SCHEMBL1919371 | 0.80 | TSHR (0.43) | ALDH1A1TP53CYP3A4HIF1ATSHR | |
| SCHEMBL10953217 | 0.80 | TSHR (0.43) | ALDH1A1TP53CYP3A4HIF1ATSHR | |
| SCHEMBL184163 | 0.80 | TSHR (0.43) | ALDH1A1TP53CYP3A4HIF1ATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3474952-B1 | COMPOSITIONS CONTAINING LATEX PARTICLES AND UV ABSORBERS | ROHM & HAAS (US) | 2021-07-28 | — | — | EP | claimed |
| US-20190133913-A1 | COMPOSITIONS CONTAINING LATEX PARTICLES AND UV ABSORBERS | ROHM & HAAS (US) | 2019-05-09 | — | — | US | claimed |
| EP-3474952-A1 | COMPOSITIONS CONTAINING LATEX PARTICLES AND UV ABSORBERS | Rohm and Haas Company (US) | 2019-05-01 | — | — | EP | claimed |
| WO-2017222570-A1 | COMPOSITIONS CONTAINING LATEX PARTICLES AND UV ABSORBERS | ROHM AND HAAS COMPANY (US) | 2017-12-28 | — | — | WO | claimed |
| EP-0376590-B1 | Monomer or polymer composition derived from acryloxy alkyl cyanoacetamides | ROHM & HAAS (US) | 1994-11-30 | — | — | EP | claimed |
| US-5021511-A | Reacted with carbon-michael addition acceptor; coatings, adhesives, caulks, mastics; nonhydrolyzing | ROHM AND HAAS COMPANY (US) | 1991-06-04 | — | — | US | claimed |
| EP-0376590-A2 | Monomer or polymer composition derived from acryloxy alkyl cyanoacetamides | ROHM AND HAAS COMPANY (US) | 1990-07-04 | — | — | EP | claimed |
| US-4877818-A | PHOTORESISTS | ROHM AND HAAS COMPANY (US) | 1989-10-31 | — | — | US | claimed |
| EP-0176356-B1 | PHOTOSENSITIVE POLYMER COMPOSITIONS, ELECTROPHORETIC DEPOSITION PROCESSES USING SAME, AND THE USE OF SAME IN FORMING FILMS ON SUBSTRATES | ROHM AND HAAS COMPANY (US) | 1988-11-02 | — | — | EP | claimed |
| EP-0176356-A2 | Photosensitive polymer compositions, electrophoretic deposition processes using same, and the use of same in forming films on substrates | ROHM AND HAAS COMPANY (US) | 1986-04-02 | — | — | EP | claimed |
| US-20190133913-A1 | COMPOSITIONS CONTAINING LATEX PARTICLES AND UV ABSORBERS | ROHM & HAAS (US) | 2019-05-09 | — | — | US | disclosed |
| EP-3474952-A1 | COMPOSITIONS CONTAINING LATEX PARTICLES AND UV ABSORBERS | Rohm and Haas Company (US) | 2019-05-01 | — | — | EP | disclosed |
| WO-2017222570-A1 | COMPOSITIONS CONTAINING LATEX PARTICLES AND UV ABSORBERS | ROHM AND HAAS COMPANY (US) | 2017-12-28 | — | — | WO | disclosed |
| EP-1632281-B1 | Process for absorbing hydrophobic substances in polymers having an hollow structure | ROHM & HAAS (US) | 2011-09-14 | — | — | EP | disclosed |
| EP-1510318-B1 | Process for manufacturing polymers | ROHM & HAAS (US) | 2009-07-01 | — | — | EP | disclosed |
| EP-1092421-A2 | Method for preparing ultraviolet radiation absorbing compositions | ROHM AND HAAS COMPANY (US) | 2001-04-18 | — | — | EP | disclosed |
| EP-0376590-B1 | Monomer or polymer composition derived from acryloxy alkyl cyanoacetamides | ROHM & HAAS (US) | 1994-11-30 | — | — | EP | disclosed |
| US-5021511-A | Reacted with carbon-michael addition acceptor; coatings, adhesives, caulks, mastics; nonhydrolyzing | ROHM AND HAAS COMPANY (US) | 1991-06-04 | — | — | US | disclosed |
| EP-0376590-A2 | Monomer or polymer composition derived from acryloxy alkyl cyanoacetamides | ROHM AND HAAS COMPANY (US) | 1990-07-04 | — | — | EP | disclosed |
| US-4877818-A | PHOTORESISTS | ROHM AND HAAS COMPANY (US) | 1989-10-31 | — | — | US | disclosed |