⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4232173 | 0.72 | — | — | |
| SCHEMBL1493150 | 0.72 | — | — | |
| SCHEMBL2869434 | 0.72 | — | — | |
| SCHEMBL5408970 | 0.71 | — | — | |
| SCHEMBL1225558 | 0.69 | — | — | |
| SCHEMBL346590 | 0.69 | — | — | |
| SCHEMBL2965396 | 0.69 | — | — | |
| SCHEMBL8789218 | 0.67 | — | — | |
| SCHEMBL3886847 | 0.67 | — | — | |
| SCHEMBL1634411 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8642718-B2 | Curable composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-02-04 | — | — | US | disclosed |
| EP-1882713-B1 | CURABLE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2013-07-03 | — | — | EP | disclosed |
| US-8394920-B2 | Composition for resin and optical lens obtained therefrom | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-03-12 | — | — | US | disclosed |
| US-8013084-B2 | Manufacturing method and apparatus of optical material | SEIKO EPSON CORPORATION (JP) | 2011-09-06 | — | — | US | disclosed |
| US-20100331515-A1 | COMPOSITION FOR RESIN AND OPTICAL LENS OBTAINED THEREFROM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2010-12-30 | — | — | US | disclosed |
| EP-2243798-A1 | COMPOSITION FOR RESIN AND OPTICAL LENS OBTAINED THEREFROM | Mitsubishi Gas Chemical Company, Inc. (JP) | 2010-10-27 | — | — | EP | disclosed |
| EP-1378535-B1 | POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN | MITSUBISHI GAS CHEMICAL CO (JP) | 2009-11-11 | — | — | EP | disclosed |
| EP-2072560-A2 | Manufacturing method and apparatus of optical material | SEIKO EPSON CORPORATION (JP) | 2009-06-24 | — | — | EP | disclosed |
| US-20090156781-A1 | Manufacturing Method and Apparatus of Optical Material | SEIKO EPSON CORPORATION (JP) | 2009-06-18 | — | — | US | disclosed |
| US-20090018308-A1 | Curable Composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2009-01-15 | — | — | US | disclosed |
| US-7446163-B2 | Polymerization regulator and composition for resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-11-04 | — | — | US | disclosed |
| EP-1882713-A1 | CURABLE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-01-30 | — | — | EP | disclosed |
| US-20050261467-A1 | Polymerization regulator and composition for resin | TAMURA MASAKI | 2005-11-24 | — | — | US | disclosed |
| EP-1378535-A1 | POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-01-07 | — | — | EP | disclosed |