⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4232173 | 0.76 | — | — | |
| SCHEMBL14560562 | 0.76 | TSHR (0.32) | — | |
| SCHEMBL447743 | 0.76 | TET2 (0.39) | — | |
| SCHEMBL5088974 | 0.74 | TDP1 (0.41) | — | |
| SCHEMBL8789218 | 0.71 | — | — | |
| SCHEMBL2468149 | 0.71 | — | — | |
| SCHEMBL9156218 | 0.70 | ALDH1A1 (0.44) | — | |
| SCHEMBL599206 | 0.69 | — | — | |
| SCHEMBL8733613 | 0.69 | — | — | |
| SCHEMBL16922257 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7192684-B2 | Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-7192684-B2 | Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-20040067436-A1 | Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-04-08 | — | — | US | disclosed |