Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.58 |
| ▸ | ATM | Q13315 | 2/20 | 0.58 |
| ▸ | BCHE | P06276 | 1/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.47 |
| ▸ | GAA | P10253 | 2/20 | 0.47 |
| ▸ | RXRA | P19793 | 1/20 | 0.47 |
| ▸ | RXRB | P28702 | 1/20 | 0.47 |
| ▸ | RXRG | P48443 | 1/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.43 |
| ▸ | MAPT | P10636 | 3/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.42 |
| ▸ | RBP4 | P02753 | 3/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | NAMPT | P43490 | 1/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | P2RY1 | P47900 | 1/20 | 0.39 |
| ▸ | ELANE | P08246 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL47807 | 0.91 | TDP1 (0.62) | TDP1ATMBCHEKDM4EALDH1A1 | |
| SCHEMBL30134334 | 0.91 | TDP1 (0.62) | TDP1ATMBCHEKDM4EALDH1A1 | |
| SCHEMBL247541 | 0.87 | ATM (0.46) | TDP1ATMBCHEKDM4EALDH1A1 | |
| SCHEMBL11406153 | 0.86 | ATM (0.43) | TDP1ATMKDM4EALDH1A1NPSR1 | |
| SCHEMBL247688 | 0.85 | ATM (0.43) | TDP1ATMBCHEKDM4EALDH1A1 | |
| SCHEMBL11137016 | 0.84 | MAOB (0.54) | TDP1ATMKDM4EALDH1A1GAA | |
| SCHEMBL17923940 | 0.82 | TDP1 (0.57) | TDP1ATMBCHEKDM4EALDH1A1 | |
| SCHEMBL14728386 | 0.82 | KMT2A (0.41) | TDP1ATMKDM4EALDH1A1NPSR1 | |
| SCHEMBL47808 | 0.82 | TDP1 (0.65) | TDP1ATMBCHEKDM4EALDH1A1 | |
| SCHEMBL31304747 | 0.82 | TDP1 (0.65) | TDP1ATMBCHEKDM4EALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 156 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3174935-B1 | COPOLYCARBONATE COMPOUNDS WITH CYCLIC AND LINEAR OLIGOMERS AND IMPROVED OPTICAL PROPERTIES | COVESTRO INTELLECTUAL PROPERTY GMBH & CO KG (DE) | 2023-06-21 | — | — | EP | disclosed |
| EP-3174934-B1 | COPOLYCARBONATE COMPOUNDS WITH CYCLIC AND LINEAR OLIGOMERS AND IMPROVED RHEOLOGICAL PROPERTIES | COVESTRO INTELLECTUAL PROPERTY GMBH & CO KG (DE) | 2023-06-14 | — | — | EP | disclosed |
| EP-3227374-B1 | COPOLYCARBONATE COMPOUNDS WITH IMPROVED RHEOLOGICAL AND OPTICAL PROPERTIES CONTAINING DIGLYCEROLESTER | COVESTRO INTELLECTUAL PROPERTY GMBH & CO KG (DE) | 2022-06-01 | — | — | EP | disclosed |
| EP-3452530-B1 | COPOLYCARBONATE AS SUPPORT MATERIAL FOR 3D PRINTING | COVESTRO INTELLECTUAL PROPERTY GMBH & CO KG (DE) | 2020-09-30 | — | — | EP | disclosed |
| EP-3227387-B1 | COPOLYCARBONATE COMPOUNDS WITH IMPROVED PROCESSABILITY CONTAINING PE WAXES | COVESTRO DEUTSCHLAND AG (DE) | 2020-03-11 | — | — | EP | disclosed |
| US-10323145-B2 | Copolycarbonate compositions with cyclic and linear oligomers and improved optical properties | COVESTRO DEUTSCHLAND AG (DE) | 2019-06-18 | — | — | US | disclosed |
| US-20190143582-A1 | COPOLYCARBONATE AS A SUPPORTING MATERIAL IN 3-D PRINTING | COVESTRO DEUTSCHLAND AG (DE) | 2019-05-16 | — | — | US | disclosed |
| EP-2496636-B1 | MORE FLAME-RETARDANT POLYCARBONATE COMPOSITION FOR USE IN EXTRUDED PRODUCTS | COVESTRO DEUTSCHLAND AG (DE) | 2019-05-15 | — | — | EP | disclosed |
| US-10272654-B2 | Polycarbonate composition having improved flame resistance for extrusion applications | COVESTRO DEUTSCHLAND AG (DE) | 2019-04-30 | — | — | US | disclosed |
| EP-3452530-A1 | COPOLYCARBONATE AS A SUPPORTING MATERIAL IN 3-D PRINTING | Covestro Deutschland AG (DE) | 2019-03-13 | — | — | EP | disclosed |
| WO-2002085967-A1 | METHOD FOR CONTINUOUSLY PRODUCING POLYCARBONATES ACCORDING TO THE MELT TRANSESTERIFICATION METHOD | BAYER AKTIENGESELLSCHAFT (DE) | 2002-10-31 | — | — | WO | disclosed |
| EP-1253163-A1 | Process for continuously preparing polycarbonates by transesterification | BAYER AG (DE) | 2002-10-30 | — | — | EP | disclosed |
| WO-2002077067-A2 | METHOD FOR PRODUCING POLYCARBONATES | BAYER AKTIENGESELLSCHAFT (DE) | 2002-10-03 | — | — | WO | disclosed |
| WO-2002077066-A1 | METHOD FOR PRODUCING OLIGOCARBONATES | BAYER AKTIENGESELLSCHAFT (DE) | 2002-10-03 | — | — | WO | disclosed |
| US-20020137874-A1 | Process for producing oligocarbonates | COVESTRO DEUTSCHLAND AG (DE) | 2002-09-26 | — | — | US | disclosed |
| WO-2002046272-A2 | POLYCARBONATE RESIN COMPOSITION FOR OPTICAL APPLICATIONS AND METHODS FOR MANUFACTURE THEREOF | GENERAL ELECTRIC COMPANY (US) | 2002-06-13 | — | — | WO | disclosed |
| US-6403280-B1 | TERPOLYMER COMPRISING MALEIC ANHYDRIDE, NORBORNENE ESTER DERIVATIVE, AND ALICYCLIC (METH)ACRYLATE MONOMERS; DURABILITY TO DRY ETCHING; TRANSPARENCY, STORAGE STABILITY | JSR CORPORATION (JP) | 2002-06-11 | — | — | US | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| US-5213946-A | POSITIVE TYPE, PHOTOSENSITIVE RESINOUS COMPOSITION | NIPPON PAINT CO., LTD. (JP) | 1993-05-25 | — | — | US | disclosed |
| EP-0519128-A1 | A positive type, photosensitive resinous composition | Nippon Paint Co., Ltd. (JP) | 1992-12-23 | — | — | EP | disclosed |