⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL706698 | 0.88 | — | — | |
| SCHEMBL707569 | 0.88 | — | — | |
| SCHEMBL4073970 | 0.83 | — | — | |
| SCHEMBL4077383 | 0.83 | — | — | |
| SCHEMBL704193 | 0.83 | — | — | |
| SCHEMBL4270164 | 0.83 | — | — | |
| SCHEMBL4275389 | 0.83 | — | — | |
| SCHEMBL4081302 | 0.83 | — | — | |
| SCHEMBL703837 | 0.83 | — | — | |
| SCHEMBL29262828 | 0.80 | LMNA (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 185 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4652144-A1 | PHOTOCURABLE SOL-GEL COMPOSITIONS | D. Swarovski KG (AT) | 2025-11-26 | — | — | EP | claimed |
| WO-2024153718-A1 | PHOTOCURABLE SOL-GEL COMPOSITIONS | D. SWAROVSKI KG (AT) | 2024-07-25 | — | — | WO | claimed |
| US-10991571-B2 | High temperature atomic layer deposition of silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2021-04-27 | — | — | US | claimed |
| US-20190189431-A1 | High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films | VERSUM MATERIALS US, LLC (US) | 2019-06-20 | — | — | US | claimed |
| US-20170256399-A9 | High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2017-09-07 | — | — | US | claimed |
| US-20160365244-A1 | High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-12-15 | — | — | US | claimed |
| US-20130295779-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC | 2013-11-07 | — | — | US | claimed |
| EP-2650399-A2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-16 | — | — | EP | claimed |
| EP-4652144-A1 | PHOTOCURABLE SOL-GEL COMPOSITIONS | D. Swarovski KG (AT) | 2025-11-26 | — | — | EP | disclosed |
| US-20250188609-A1 | SEAM-FREE AND CRACK-FREE DEPOSITION | LAM RES CORP (US) | 2025-06-12 | — | — | US | disclosed |
| CN-119998691-A | Antireflection film, liquid composition set, and method for producing antireflection film | 日本板硝子株式会社 | 2025-05-13 | — | — | CN | disclosed |
| US-20250038003-A1 | LOW TEMPERATURE MOLYBDENUM DEPOSITION ASSISTED BY SILICON-CONTAINING REACTANTS | LAM RESEARCH CORPORATION (US) | 2025-01-30 | — | — | US | disclosed |
| US-20250014890-A1 | CONFORMAL, CARBON-DOPED SILICON NITRIDE FILMS AND METHODS THEREOF | LAM RESEARCH CORPORATION | 2025-01-09 | — | — | US | disclosed |
| WO-2024243002-A1 | LOW PRESSURE CHEMICAL VAPOR DEPOSITION OF SILICON OXIDE | LAM RESEARCH CORPORATION (US) | 2024-11-28 | — | — | WO | disclosed |
| US-4420594-A | USING AS CATALYST A REACTION PRODUCT OF AN ALUMINUM HALIDE WITH AN ORGANIC SILICON COMPOUND FOLLOWED BY REACTION WITH A GRIGNARD COMPOUND AND TITANIUM TETRAHALIDE | UBE INDUSTRIES, LTD. (JP) | 1983-12-13 | — | — | US | disclosed |
| EP-0095855-A1 | Process for polymerizing ethylene | UBE INDUSTRIES, LTD. (JP) | 1983-12-07 | — | — | EP | disclosed |
| EP-0074276-A1 | Process for polymerization of ethylene | UBE INDUSTRIES, LTD. (JP) | 1983-03-16 | — | — | EP | disclosed |
| EP-0074275-A1 | Process for polymerization of alpha-olefins | UBE INDUSTRIES, LTD. (JP) | 1983-03-16 | — | — | EP | disclosed |
| US-4365048-A | COORDINATION CATALYST, ALUMINUM COCATALYST, ESTER | UBE INDUSTRIES, LTD. (JP) | 1982-12-21 | — | — | US | disclosed |
| US-4332654-A | Photoactivated catalytic hydrosilylation of carbonyl compounds | THE DOW CHEMICAL COMPANY (US) | 1982-06-01 | — | — | US | disclosed |