Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 1/20 | 0.36 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.36 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.36 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.36 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.36 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.36 |
| ▸ | GABRA4 | P48169 | 1/20 | 0.36 |
| ▸ | GABRA6 | Q16445 | 1/20 | 0.36 |
| ▸ | MAP2K2 | P36507 | 1/20 | 0.30 |
| ▸ | MAP2K1 | Q02750 | 1/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24776177 | 0.88 | GABRA1 (0.36) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL23065534 | 0.83 | HDAC3 (0.33) | — | |
| SCHEMBL24776171 | 0.83 | PTPN2 (0.39) | KDM4ETSHRNPSR1TDP1L3MBTL1 | |
| SCHEMBL22876790 | 0.82 | TTR (0.34) | — | |
| SCHEMBL18785641 | 0.80 | MAPK1 (0.41) | — | |
| SCHEMBL24776175 | 0.78 | GABRA1 (0.31) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL24776170 | 0.78 | MAPK1 (0.41) | NPSR1TDP1L3MBTL1 | |
| SCHEMBL19846344 | 0.77 | NPSR1 (0.31) | KDM4ETSHRNPSR1TDP1L3MBTL1 | |
| SCHEMBL29346576 | 0.77 | — | — | |
| SCHEMBL24776172 | 0.77 | ESR1 (0.40) | KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2022265034-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUNDS, INTERMEDIATE, AND COMPOUNDS | 東京応化工業株式会社 | 2022-12-22 | — | — | WO | disclosed |