SCHEMBL2479675

SCHEMBL2479675

CCO[Si]1(C)CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4366429 0.97
SCHEMBL17330299 0.94
SCHEMBL3956499 0.88
SCHEMBL17330294 0.78
SCHEMBL2864111 0.78
SCHEMBL20942813 0.76
SCHEMBL2866867 0.76
SCHEMBL2855268 0.75
SCHEMBL17498472 0.74 ADRB2 (0.35)
SCHEMBL15157466 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109942619-B Synthesis method of 1-methyl-1-ethoxy-silacyclopentane 山东东岳有机硅材料股份有限公司 2021-08-10 CN claimed
EP-2993687-B1 METHOD FOR PROVIDING PORE SEALING LAYER ON POROUS LOW DIELECTRIC CONSTANT FILMS VERSUM MAT US LLC (US) 2020-02-05 EP claimed
US-10395920-B2 Alkyl-alkoxysilacyclic compounds VERSUM MATERIALS US, LLC (US) 2019-08-27 US claimed
US-20180277360-A1 Method and Composition for Providing Pore Sealing Layer on Porous Low Dielectric Constant Films VERSUM MATERIALS US, LLC (US) 2018-09-27 US claimed
EP-3358602-A1 ALKYL-ALKOXYSILACYCLIC COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME Versum Materials US, LLC (US) 2018-08-08 EP claimed
EP-2958135-B1 METHODS FOR DEPOSITING FILMS USING ALKYL-ALKOXYSILACYCLIC COMPOUNDS VERSUM MAT US LLC (US) 2018-03-28 EP claimed
US-9922818-B2 Alkyl-alkoxysilacyclic compounds VERSUM MATERIALS US, LLC (US) 2018-03-20 US claimed
EP-2993687-A1 METHOD AND COMPOSITION FOR PROVIDING PORE SEALING LAYER ON POROUS LOW DIELECTRIC CONSTANT FILMS AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-03-09 EP claimed
US-20160049293-A1 METHOD AND COMPOSITION FOR PROVIDING PORE SEALING LAYER ON POROUS LOW DIELECTRIC CONSTANT FILMS AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-02-18 US claimed
EP-2958135-A1 ALKYL-ALKOXYSILACYCLIC COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-12-23 EP claimed
US-20150364321-A1 Alkyl-Alkoxysilacyclic Compounds and Methods for Depositing Films Using Same AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-12-17 US claimed
US-7500397-B2 Activated chemical process for enhancing material properties of dielectric films AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-03-10 US claimed
US-20080199977-A1 Activated Chemical Process for Enhancing Material Properties of Dielectric Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2008-08-21 US claimed
EP-1959485-A2 Activated chemical process for enhancing material properties of dielectric films Air Products and Chemicals, Inc. (US) 2008-08-20 EP claimed
US-20260107711-A1 PRECURSORS FOR DEPOSITING FILMS WITH ELASTIC MODULUS VERSUM MAT US LLC (US) 2026-04-16 US disclosed
US-12563982-B2 Additives to enhance the properties of dielectric films VERSUM MATERIALS US, LLC (US) 2026-02-24 US disclosed
EP-4110969-B1 NEW PRECURSORS FOR DEPOSITING FILMS WITH HIGH ELASTIC MODULUS VERSUM MAT US LLC (US) 2025-12-10 EP disclosed
US-7500397-B2 Activated chemical process for enhancing material properties of dielectric films AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-03-10 US disclosed
US-20080199977-A1 Activated Chemical Process for Enhancing Material Properties of Dielectric Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2008-08-21 US disclosed
EP-1959485-A2 Activated chemical process for enhancing material properties of dielectric films Air Products and Chemicals, Inc. (US) 2008-08-20 EP disclosed