⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL17874336 | 0.96 | TDP1 (0.44) | — | |
| Methacrylic Acid SCHEMBL28196061 | 0.96 | TDP1 (0.44) | — | |
| Methacrylic Acid SCHEMBL9418245 | 0.93 | TDP1 (0.42) | — | |
| Methacrylic Acid SCHEMBL28083683 | 0.93 | TDP1 (0.42) | — | |
| Methacrylic Acid SCHEMBL20679992 | 0.92 | — | — | |
| Methacrylic Acid SCHEMBL28306181 | 0.92 | TDP1 (0.47) | — | |
| Methacrylic Acid SCHEMBL11235035 | 0.92 | TDP1 (0.53) | — | |
| Methacrylic Acid SCHEMBL15005463 | 0.92 | TDP1 (0.53) | — | |
| Methacrylic Acid SCHEMBL491341 | 0.92 | TDP1 (0.53) | — | |
| Methacrylic Acid SCHEMBL15043 | 0.92 | TDP1 (0.53) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104007623-B | The chemical reinforced slushing compound of positive tone organic solvent imaging | 国际商业机器公司 | 2017-06-16 | — | — | CN | claimed |
| US-8900802-B2 | Positive tone organic solvent developed chemically amplified resist | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-12-02 | — | — | US | claimed |
| US-20140242526-A1 | POSITIVE TONE ORGANIC SOLVENT DEVELOPED CHEMICALLY AMPLIFIED RESIST | JSR CORPORATION (JP) | 2014-08-28 | — | — | US | claimed |
| US-20260070815-A1 | PHOTOOXIDATION OF PFAS AT 222 nm | CLAROS TECHNOLOGIES INC. (US) | 2026-03-12 | — | — | US | disclosed |
| US-8900802-B2 | Positive tone organic solvent developed chemically amplified resist | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-12-02 | — | — | US | disclosed |
| US-20140242526-A1 | POSITIVE TONE ORGANIC SOLVENT DEVELOPED CHEMICALLY AMPLIFIED RESIST | JSR CORPORATION (JP) | 2014-08-28 | — | — | US | disclosed |
| EP-0969282-B1 | An enzyme electrode and a biosensor and a measuring apparatus therewith | NEC CORP (JP) | 2011-09-21 | — | — | EP | disclosed |
| US-7135595-B2 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-11-14 | — | — | US | disclosed |
| US-20060128914-A1 | photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-06-15 | — | — | US | disclosed |
| US-7014980-B2 | Includes a polymer containing at least one of the following monomers: 1,1,1-trifluoro-2-trifluoromethyl-2-hydroxy-(4 or 5)-pentyl (meth)acrylate or 2-{[5-(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornyl]}(meth)acrylate | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-03-21 | — | — | US | disclosed |
| US-20050019696-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-01-27 | — | — | US | disclosed |
| US-6806026-B2 | POLYMER OF A FLUORINATED HYDROXYALKYL ACRYLATE | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-10-19 | — | — | US | disclosed |
| US-20030224283-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-12-04 | — | — | US | disclosed |
| US-6280587-B1 | FOR ELECTROCHEMICALLY DETERMINING PARTICULAR CHEMICAL SUBSTANCE IN SOLUTION VIA AN ENZYME REACTION; E.G. FOR MEASURING A GLUCOSE CONCENTRATION IN URINE | NEC CORPORATION (JP) | 2001-08-28 | — | — | US | disclosed |
| EP-0969282-A2 | An enzyme electrode and a biosensor and a measuring apparatus therewith | NEC CORPORATION (JP) | 2000-01-05 | — | — | EP | disclosed |