Methacrylic Acid

Methacrylic Acid

SCHEMBL491341

C=C(C)C(=O)O.C=C(C)C(=O)O.C=C(C)C(=O)O.C=C(C)C(=O)O.C=C(C)C(=O)O

nearest known ligand 0.54

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.53
FFAR3 O14843 1/20 0.50
LCK P06239 1/20 0.50
FYN P06241 1/20 0.50
ALDH1A1 P00352 3/20 0.44
LMNA P02545 3/20 0.42
HSD17B10 Q99714 1/20 0.39
TSHR P16473 2/20 0.39
THPO P40225 1/20 0.39
CA1 P00915 3/20 0.36
ALOX15 P16050 1/20 0.36
BLM P54132 1/20 0.36
PMP22 Q01453 1/20 0.36
TGFBR1 P36897 1/20 0.35
LDHA P00338 1/20 0.33
LDHB P07195 1/20 0.33
TET2 Q6N021 1/20 0.33
CA2 P00918 1/20 0.33
CA9 Q16790 1/20 0.33
KDM4E B2RXH2 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL28853193 1.00
Methacrylic Acid SCHEMBL13234423 1.00
Methacrylic Acid SCHEMBL182989 1.00 TDP1 (0.53) TDP1FFAR3LCKFYNALDH1A1
Methacrylic Acid SCHEMBL15005463 1.00 TDP1 (0.53) TDP1FFAR3LCKFYNALDH1A1
Methacrylic Acid SCHEMBL2230382 1.00 TDP1 (0.53) TDP1FFAR3LCKFYNALDH1A1
Methacrylic Acid SCHEMBL195316 1.00 TDP1 (0.53) TDP1FFAR3LCKFYNALDH1A1
Methacrylic Acid SCHEMBL66252 1.00 TDP1 (0.53) TDP1FFAR3LCKFYNALDH1A1
Methacrylic Acid SCHEMBL15043 1.00 TDP1 (0.53) TDP1FFAR3LCKFYNALDH1A1
Methacrylic Acid SCHEMBL11235035 1.00 TDP1 (0.53) TDP1FFAR3LCKFYNALDH1A1
Methacrylic Acid SCHEMBL2231983 1.00 TDP1 (0.53) TDP1FFAR3LCKFYNALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 517 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114133497-B Aqueous polymer emulsion and preparation method and application thereof 万华化学集团股份有限公司 2024-04-09 CN claimed
US-20240110070-A1 PHOTORESIN FORMULATIONS AND USE THEREOF FOR VOLUMETRIC ADDITIVE MANUFACTURING NATIONAL RESEARCH COUNCIL OF CANADA (CA) 2024-04-04 US claimed
WO-2024059932-A1 PHOTORESIN FORMULATIONS AND USE THEREOF FOR VOLUMETRIC ADDITIVE MANUFACTURING NATIONAL RESEARCH COUNCIL OF CANADA (CA) 2024-03-28 WO claimed
CN-113164882-B Membrane for selective substance delivery 科德宝两合公司 2023-12-22 CN claimed
EP-3798243-B1 MODIFIED CONJUGATED DIENE-BASED POLYMER AND METHOD FOR PREPARING SAME LG CHEMICAL LTD (KR) 2023-11-01 EP claimed
CN-116239974-A Film material and conductive adhesive film using the same 南通德聚半导体材料有限公司 2023-06-09 CN claimed
US-20220125056-A1 TEMPLATED ANTIMICROBIAL MICROGELS AND METHODS OF MAKING AND USING THE SAME THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ARKANSAS 2022-04-28 US claimed
US-20220056186-A1 SEPARATOR FOR ELECTROCHEMICAL ENERGY ACCUMULATORS AND CONVERTERS CARL FREUDENBERG KG (DE) 2022-02-24 US claimed
US-20220059857-A1 MEMBRANE FOR THE SELECTIVE TRANSPORT OF SUBSTANCES CARL FREUDENBERG KG (DE) 2022-02-24 US claimed
EP-3724698-B1 METHOD FOR PRODUCING MPS-COMPATIBLE WATER GRADIENT CONTACT LENSES ALCON INC (CH) 2021-12-15 EP claimed
EP-0358007-B1 TWO-STAGE HEAT RESISTANT BINDERS FOR NONWOVENS National Starch and Chemical Investment Holding Corporation (US) 1992-07-08 EP claimed
US-5087552-A Photosensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 1992-02-11 US claimed
US-4996132-A Heat-resistant photosensitive resin composition TOYKO OHKA KOGYO CO. LTD. (JP) 1991-02-26 US claimed
US-4900763-A BLENDS OF ACRYLATED RESINS, POLYFUNCTIONAL ACRYLATES, PHOTOINITIATORS; CERAMIC INKS OR GLASS ENAMELS; PRINTING, HIGH-SPEED CURING CIBA-GEIGY CORPORATION (US) 1990-02-13 US claimed
US-4789604-A Decorative panel having improved surface properties HOECHST AKTIENGESELLSCHAFT (DE) 1988-12-06 US claimed
EP-0283990-A2 A heat-resistant photosensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 1988-09-28 EP claimed
EP-0280295-A2 A heat-resistant photosensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 1988-08-31 EP claimed
EP-0077849-B1 RESIN-FORMING MATERIAL AND RESTORATIVE MATERIAL SUITABLE FOR MEDICAL OR DENTAL USE KANEBO, LTD. (JP) 1985-02-20 EP claimed
EP-0060272-A1 ABRASION RESISTANT COATING COMPOSITION PANELGRAPHIC CORPORATION (US) 1982-09-22 EP claimed
WO-1982000782-A1 ABRASION RESISTANT COATING COMPOSITION PANELGRAPHIC CORP (US) 1982-03-18 WO claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220125056-A1 TEMPLATED ANTIMICROBIAL MICROGELS AND METHODS OF MAKING AND USING THE SAME MGAM, CD14, CD68 TDP1 4158/4885FFAR3 3960/4885LCK 816/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.