⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7062467 | 0.79 | — | — | |
| SCHEMBL361077 | 0.74 | ALDH1A1 (0.38) | — | |
| SCHEMBL127487 | 0.74 | ALDH1A1 (0.38) | — | |
| SCHEMBL11006129 | 0.73 | — | — | |
| Bromide SCHEMBL4276596 | 0.71 | ALDH1A1 (0.35) | — | |
| Hydrochloric Acid SCHEMBL142823 | 0.71 | ALDH1A1 (0.35) | — | |
| Water SCHEMBL5407251 | 0.71 | ALDH1A1 (0.35) | — | |
| SCHEMBL9805972 | 0.69 | — | — | |
| SCHEMBL8667766 | 0.69 | ALDH1A1 (0.33) | — | |
| SCHEMBL11237698 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024116456-A1 | METHOD AND DEVICE FOR REGENERATING PLATING COMPOSITION | 株式会社村田製作所 | 2024-06-06 | — | — | WO | disclosed |
| WO-2024117086-A1 | PLATING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT | 株式会社村田製作所 | 2024-06-06 | — | — | WO | disclosed |
| CN-106582435-B | A kind of synthesis technology of bisamide type glycine surfactant | 江南大学 | 2019-04-09 | — | — | CN | disclosed |
| CN-106582435-A | Synthetic process of bisamide type bisamide surfactant | 江南大学 | 2017-04-26 | — | — | CN | disclosed |
| US-8969278-B2 | Composition with surface modifying properties | ECOLAB USA INC. (US) | 2015-03-03 | — | — | US | disclosed |
| US-20120138089-A1 | COMPOSITION WITH SURFACE MODIFYING PROPERTIES | ECOLAB USA INC. (US) | 2012-06-07 | — | — | US | disclosed |
| US-8093195-B2 | Composition with surface modifying properties | ECOLAB USA INC. (US) | 2012-01-10 | — | — | US | disclosed |
| US-8088874-B2 | Crosslinked (meth)acrylic acid copolymer and secondary-cell electrode employing the same | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| EP-2042523-B1 | CROSSLINKED (METH)ACRYLIC ACID COPOLYMER AND SECONDARY-CELL ELECTRODE EMPLOYING THE SAME | SUMITOMO SEIKA CHEMICALS (JP) | 2011-04-13 | — | — | EP | disclosed |
| EP-1554368-B2 | ANTI-SOILING DETERGENT COMPOSITION | JOHNSON DIVERSEY INC (US) | 2010-02-24 | — | — | EP | disclosed |
| EP-1554368-B1 | ANTI-SOILING DETERGENT COMPOSITION | JOHNSON DIVERSEY INC (US) | 2007-03-07 | — | — | EP | disclosed |
| US-20060154840-A1 | Anti-soiling detergent composition | JOHNSONDIVERSEY, INC. | 2006-07-13 | — | — | US | disclosed |
| CN-1784770-A | Polishing liquid for CMP process and polishing method | SANYO CHEMICAL IND LTD (JP) | 2006-06-07 | — | — | CN | disclosed |
| EP-1554368-A1 | ANTI-SOILING DETERGENT COMPOSITION | JohnsonDiversey, Inc. (US) | 2005-07-20 | — | — | EP | disclosed |
| WO-2004039931-A1 | ANTI-SOILING DETERGENT COMPOSITION | JOHNSONDIVERSEY, INC. (US) | 2004-05-13 | — | — | WO | disclosed |
| US-6132931-A | A FLUORINE-CONTAINING POLYURETHANE COPOLYMER; FORMING A HIGH CONTRAST IMAGE, INHIBITING HALATION, A SAFE LIGHT TOLERANCE AND A WIDE DEVELOPMENT LATITUDE, WITHOUT LOWERING THE SENSITIVITY | FUJI PHOTO FILM CO., LTD. (JP) | 2000-10-17 | — | — | US | disclosed |
| US-6110640-A | Photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2000-08-29 | — | — | US | disclosed |
| EP-0843218-A1 | Photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-05-20 | — | — | EP | disclosed |
| EP-0684521-B1 | Positive working photosensitive compositions | FUJI PHOTO FILM CO LTD (JP) | 1998-01-14 | — | — | EP | disclosed |
| US-5609983-A | QUINONE DIAZIDE WITH N-SULFONAMIDE | FUJI PHOTO FILM CO., LTD. (JP) | 1997-03-11 | — | — | US | disclosed |