SCHEMBL248147

SCHEMBL248147

C=C(C)C(=O)OCC(O)CC(F)(F)C(F)(F)C(F)(F)C(F)(F)CC(O)COC(=O)C(=C)C

nearest known ligand 0.50

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.50
THRB P10828 1/20 0.36
ALDH1A1 P00352 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7771149 0.98 TSHR (0.49) TSHRTHRBALDH1A1
SCHEMBL7771162 0.98 TSHR (0.49) TSHRTHRBALDH1A1
SCHEMBL7767146 0.97 TSHR (0.50) TSHRTHRBALDH1A1
SCHEMBL711903 0.95 TSHR (0.46) TSHRTHRBALDH1A1
SCHEMBL23369808 0.94 TSHR (0.45) TSHRTHRBALDH1A1
SCHEMBL712225 0.94 TSHR (0.45) TSHRTHRBALDH1A1
SCHEMBL13385974 0.94 TSHR (0.49) TSHRTHRBALDH1A1
SCHEMBL7774854 0.94 TSHR (0.45) TSHRTHRBALDH1A1
SCHEMBL711741 0.94 TSHR (0.45) TSHRTHRBALDH1A1
SCHEMBL868315 0.94 TSHR (0.45) TSHRTHRBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160187540-A2 METHOD FOR PRODUCING ANTIREFLECTION FILM, ANTIREFLECTION FILM, AND COATING COMPOSITION FUJIFILM CORPORATION (JP) 2016-06-30 US disclosed
US-8679578-B2 Method of manufacturing anti-reflection film, anti-reflection film and coating composition FUJIFILM CORPORATION (JP) 2014-03-25 US disclosed
US-20130084442-A1 METHOD OF MANUFACTURING ANTI-REFLECTION FILM, ANTI-REFLECTION FILM AND COATING COMPOSITION FUJIFILM CORPORATION (JP) 2013-04-04 US disclosed
US-20120207992-A1 PRODUCTION METHOD OF ANTIREFLECTION FILM, ANTIREFLECTION FILM AND COATING COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-16 US disclosed
US-20120207990-A1 PRODUCTION METHOD OF ANTIREFLECTION FILM, ANTIREFLECTION FILM AND COATING COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-16 US disclosed
US-20120003467-A1 Antistatic laminate, optical film, polarizing plate, image display device and production method of antistatic laminate FUJI FILM CORPORATION (JP) 2012-01-05 US disclosed
US-20110026121-A1 Laminate, antireflective film, polarizing plate and image display device FUJIFILM CORPORATION (JP) 2011-02-03 US disclosed
US-20110026126-A1 Antireflection film, polarizing plate and image display device FUJIFILM CORPORATION (JP) 2011-02-03 US disclosed
EP-0820980-B1 FLUORINATED POLYFUNCTIONAL (METH)ACRYLIC ESTERS, FLUOROMONOMER COMPOSITION, MATERIAL WITH LOW REFRACTIVE INDEX, AND LOWLY REFLECTIVE FILM NOF CORP (JP) 2001-07-11 EP disclosed
US-6254973-B1 WEAR RESISTANCE NOF CORPORATION (JP) 2001-07-03 US disclosed
EP-0820980-A1 FLUORINATED POLYFUNCTIONAL (METH)ACRYLIC ESTERS, FLUOROMONOMER COMPOSITION, MATERIAL WITH LOW REFRACTIVE INDEX, AND LOWLY REFLECTIVE FILM NOF CORPORATION (JP) 1998-01-28 EP disclosed