SCHEMBL2482500

SCHEMBL2482500

CCCCCCCCCCCCCCCCCCCCCCCCCCC(=O)NC(CCCCCCCC)CCCCCCCCCCCCCCCCCCCCCCCCC

nearest known ligand 0.77

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
PLA2G2C Q5R387 2/20 0.77
DNM1 Q05193 1/20 0.68
FAAH O00519 4/20 0.66
MEN1 O00255 2/20 0.66
KMT2A Q03164 2/20 0.66
MAPK1 P28482 1/20 0.66
PLA2G10 O15496 2/20 0.64
NOD1 Q9Y239 2/20 0.57
CPT2 P23786 1/20 0.55
CPT1A P50416 1/20 0.55
CPT1B Q92523 1/20 0.55
HSP90AA1 P07900 1/20 0.55
ENPP2 Q13822 1/20 0.51
PLA2G4A P47712 1/20 0.50
PLA2G1B P04054 1/20 0.49
PLA2G2A P14555 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30679514 1.00 PLA2G2C (0.77) PLA2G2CDNM1FAAHMEN1KMT2A
SCHEMBL27536177 1.00 PLA2G2C (0.77) PLA2G2CDNM1FAAHMEN1KMT2A
SCHEMBL27753924 1.00 PLA2G2C (0.77) PLA2G2CDNM1FAAHMEN1KMT2A
SCHEMBL31364557 1.00 PLA2G2C (0.77) PLA2G2CDNM1FAAHMEN1KMT2A
SCHEMBL31318140 1.00 PLA2G2C (0.77) PLA2G2CDNM1FAAHMEN1KMT2A
SCHEMBL25067268 1.00 PLA2G2C (0.77) PLA2G2CDNM1FAAHMEN1KMT2A
SCHEMBL6943359 0.92 PLA2G2C (0.67) PLA2G2CDNM1FAAHMEN1KMT2A
SCHEMBL24864022 0.91 PLA2G2C (0.67) PLA2G2CDNM1FAAHMEN1KMT2A
SCHEMBL25417289 0.91 DNM1 (0.68) PLA2G2CDNM1FAAHMEN1KMT2A
SCHEMBL24767613 0.91 PLA2G2C (0.66) PLA2G2CDNM1FAAHMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8742023-B2 Absorbent resin particle, process for producing the same, absorber containing the same, and absorbent article SAN-DIA POLYMERS, LTD. (JP) 2014-06-03 US disclosed
EP-2377897-B1 ABSORBING RESIN PARTICLES, PROCESS FOR PRODUCING SAME, AND ABSORBENT AND ABSORBING ARTICLE BOTH INCLUDING SAME SAN DIA POLYMERS LTD (JP) 2014-04-23 EP disclosed
US-20110301560-A1 ABSORBENT RESIN PARTICLE, PROCESS FOR PRODUCING THE SAME, ABSORBER CONTAINING THE SAME, AND ABSORBENT ARTICLE SAN-DIA POLYMERS, LTD. (JP) 2011-12-08 US disclosed
EP-2377897-A1 ABSORBING RESIN PARTICLES, PROCESS FOR PRODUCING SAME, AND ABSORBENT AND ABSORBING ARTICLE BOTH INCLUDING SAME San-Dia Polymers, Ltd. (JP) 2011-10-19 EP disclosed