Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL3681428 | 0.84 | — | — | |
| Hydrochloric Acid SCHEMBL124211 | 0.79 | — | — | |
| Hydrochloric Acid SCHEMBL1538939 | 0.77 | — | — | |
| Bromide SCHEMBL8167044 | 0.77 | — | — | |
| Hydrochloric Acid SCHEMBL1538940 | 0.77 | — | — | |
| Water SCHEMBL4251546 | 0.77 | — | — | |
| Hydrochloric Acid SCHEMBL290925 | 0.77 | — | — | |
| Hydrochloric Acid SCHEMBL1331037 | 0.77 | — | — | |
| Water SCHEMBL29018953 | 0.77 | — | — | |
| Hydrochloric Acid SCHEMBL7949476 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8389780-B2 | Polyalphaolefins and processes for forming polyalphaolefins | CHEMTURA CORPORATION (US) | 2013-03-05 | — | — | US | disclosed |
| EP-2274344-B1 | POLYALPHAOLEFINS AND PROCESSES FOR FORMING POLYALPHAOLEFINS | CHEMTURA CORP (US) | 2012-08-01 | — | — | EP | disclosed |
| EP-2395028-A1 | Process for removal of residual catalyst components | Chemtura Corporation (US) | 2011-12-14 | — | — | EP | disclosed |
| EP-2059538-B1 | PROCESS FOR REMOVAL OF RESIDUAL CATALYST COMPONENTS | CHEMTURA CORP (US) | 2011-10-19 | — | — | EP | disclosed |
| US-7767312-B2 | Layered product | JAPAN POLYETHYLENE CORPORATION (JP) | 2010-08-03 | — | — | US | disclosed |
| US-20090290004-A1 | INK RESERVOIR | CANON KABUSHIKI KAISHA (JP) | 2009-11-26 | — | — | US | disclosed |
| EP-2123459-A2 | Ink reservoir | Canon Kabushiki Kaisha (JP) | 2009-11-25 | — | — | EP | disclosed |
| US-7601255-B2 | Process for removal of residual catalyst components | CHEMTURA CORPORATION (US) | 2009-10-13 | — | — | US | disclosed |
| EP-2059538-A2 | PROCESS FOR REMOVAL OF RESIDUAL CATALYST COMPONENTS | Chemtura Corporation (US) | 2009-05-20 | — | — | EP | disclosed |
| WO-2008030387-A2 | PROCESS FOR REMOVAL OF RESIDUAL CATALYST COMPONENTS | CHEMTURA CORPORATION (US) | 2008-03-13 | — | — | WO | disclosed |
| US-7341794-B2 | Laminated film | JAPAN POLYPROPYLENE CORPORATION (JP) | 2008-03-11 | — | — | US | disclosed |
| US-20080053873-A1 | Process for removal of residual catalyst components | LANXESS SOLUTIONS US INC. | 2008-03-06 | — | — | US | disclosed |
| US-20080051518-A1 | Layered Product | JAPAN POLYETHYLENE CORPORATION (JP) | 2008-02-28 | — | — | US | disclosed |
| US-20040216846-A1 | Laminated film | JAPAN POLYPROPYLENE CORPORATION (JP) | 2004-11-04 | — | — | US | disclosed |