SCHEMBL24845356

SCHEMBL24845356

O=C(NS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)O)c1cc(C(F)(F)F)cc(C(F)(F)F)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC8 Q9BY41 4/20 0.41
HDAC3 O15379 2/20 0.41
HDAC6 Q9UBN7 2/20 0.41
GAA P10253 1/20 0.40
CES2 O00748 1/20 0.40
P2RX1 P51575 3/20 0.39
BCL2L1 Q07817 1/20 0.37
MCL1 Q07820 1/20 0.37
TACR1 P25103 1/20 0.36
RHOC P08134 4/20 0.36
RHOA P61586 4/20 0.36
HDAC4 P56524 1/20 0.36
HDAC1 Q13547 1/20 0.36
HDAC7 Q8WUI4 1/20 0.36
HDAC2 Q92769 1/20 0.36
HDAC10 Q969S8 1/20 0.36
HDAC11 Q96DB2 1/20 0.36
HDAC9 Q9UKV0 1/20 0.36
HDAC5 Q9UQL6 1/20 0.36
CA1 P00915 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24747018 0.83 CA1 (0.47) HDAC8HDAC3HDAC6GAACES2
SCHEMBL23808368 0.82 HDAC8 (0.43) HDAC8HDAC3HDAC6GAACES2
SCHEMBL26451948 0.82 HDAC8 (0.43) HDAC8HDAC3HDAC6GAACES2
SCHEMBL30646263 0.82 CA1 (0.46) HDAC8HDAC3HDAC6GAACES2
SCHEMBL24747017 0.75 CA1 (0.41) HDAC8HDAC3HDAC6GAACES2
SCHEMBL25470739 0.72 KDM4E (0.47) GAAP2RX1CA1
SCHEMBL24845355 0.72 HDAC3 (0.33) HDAC8HDAC3HDAC6HDAC4HDAC1
SCHEMBL14880119 0.69 HDAC6 (0.72) HDAC8HDAC3HDAC6GAACES2
SCHEMBL21104349 0.68 HDAC8 (0.49) HDAC8HDAC3HDAC6GAACES2
SCHEMBL22503087 0.66 HDAC6 (0.48) HDAC8HDAC3HDAC6GAAHDAC4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230004086-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-01-05 US disclosed