Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.70 |
| ▸ | HPGD | P15428 | 4/20 | 0.70 |
| ▸ | MAPT | P10636 | 4/20 | 0.70 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.70 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.70 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.70 |
| ▸ | RECQL | P46063 | 2/20 | 0.70 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.56 |
| ▸ | LMNA | P02545 | 3/20 | 0.56 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.56 |
| ▸ | PGR | P06401 | 1/20 | 0.56 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.56 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.56 |
| ▸ | PDE4A | P27815 | 1/20 | 0.56 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.56 |
| ▸ | HRH1 | P35367 | 1/20 | 0.56 |
| ▸ | HTT | P42858 | 1/20 | 0.56 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.56 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.56 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29415019 | 1.00 | KDM4E (0.70) | KDM4EHPGDMAPTALDH1A1ALOX15 | |
| SCHEMBL30320258 | 0.94 | MAPT (0.67) | KDM4EHPGDMAPTALDH1A1ALOX15 | |
| SCHEMBL5709973 | 0.94 | MAPT (0.67) | KDM4EHPGDMAPTALDH1A1ALOX15 | |
| SCHEMBL29415005 | 0.93 | HPGD (0.62) | KDM4EHPGDMAPTALDH1A1ALOX15 | |
| SCHEMBL2484859 | 0.93 | HPGD (0.62) | KDM4EHPGDMAPTALDH1A1ALOX15 | |
| SCHEMBL2486188 | 0.93 | HPGD (0.62) | KDM4EHPGDMAPTALDH1A1ALOX15 | |
| SCHEMBL29415041 | 0.93 | HPGD (0.62) | KDM4EHPGDMAPTALDH1A1ALOX15 | |
| SCHEMBL20496479 | 0.93 | HPGD (0.62) | KDM4EHPGDMAPTALDH1A1ALOX15 | |
| SCHEMBL20496448 | 0.93 | HPGD (0.62) | KDM4EHPGDMAPTALDH1A1ALOX15 | |
| SCHEMBL20496432 | 0.92 | HPGD (0.68) | KDM4EHPGDMAPTALDH1A1ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260146144-A1 | SYNERGISTIC STABILIZER COMPOSITIONS AND METHODS FOR USING SAME FOR PROTECTING ORGANIC MATERIALS FROM UV LIGHT AND THERMAL DEGRADATION | CYTEC INDUSTRIES INC. (US) | 2026-05-28 | — | — | US | claimed |
| WO-2025099143-A1 | COMPOSITIONS FOR STABILIZING POLYMERIC MATERIALS AGAINST UV LIGHT THERMAL AND GAS FADING DEGRADATION | CYTEC INDUSTRIES INC. (US) | 2025-05-15 | — | — | WO | claimed |
| US-12215215-B2 | Stabilizer compositions and methods for using same for protecting polymeric organic materials from UV light and thermal degradation | CYTEC INDUSTRIES INC. (US) | 2025-02-04 | — | — | US | claimed |
| EP-4363506-A1 | COMPOSITIONS AND METHODS FOR PROTECTING COATINGS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT | Cytec Industries Inc. (US) | 2024-05-08 | — | — | EP | claimed |
| CN-117597403-A | Composition and method for protecting a coating from harmful effects of exposure to UV-C light | 塞特工业公司 | 2024-02-23 | — | — | CN | claimed |
| EP-4251689-A1 | COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT | Cytec Industries, Inc. (US) | 2023-10-04 | — | — | EP | claimed |
| EP-4251690-A1 | COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM THE DELETERIOUS EFFECTS EXPOSURE TO UV-C LIGHT | Cytec Industries Inc. (US) | 2023-10-04 | — | — | EP | claimed |
| CN-116783246-A | Compositions and methods for protecting organic polymeric materials from discoloration due to exposure to UV-C light | 塞特工业公司 | 2023-09-19 | — | — | CN | claimed |
| CN-116745353-A | Compositions and methods for protecting organic polymeric materials from the deleterious effects of UV-C light exposure | 塞特工业公司 | 2023-09-12 | — | — | CN | claimed |
| WO-2023278282-A1 | COMPOSITIONS AND METHODS FOR PROTECTING COATINGS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT | CYTEC INDUSTRIES INC. (US) | 2023-01-05 | — | — | WO | claimed |
| WO-2022115573-A1 | COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT | CYTEC INDUSTRIES INC. (US) | 2022-06-02 | — | — | WO | claimed |
| US-10975278-B2 | Granular stabilizer compositions for use in polymer resins and methods of making same | CYTEC INDUSTRIES INC. (US) | 2021-04-13 | — | — | US | claimed |
| WO-2021066218-A1 | VINYL CHLORIDE RESIN COMPOSITION, COMPRISING DI(2-ETHYLHEXYL)CYCLOHEXANE-1,4-DICARBOXYLATE, HAVING EXCELLENT UV STABILITY | 한화솔루션 주식회사 | 2021-04-08 | — | — | WO | claimed |
| EP-3759164-A1 | GRANULAR STABILIZER COMPOSITIONS FOR USE IN POLYMER RESINS AND METHODS OF MAKING SAME | Cytec Industries Inc. (US) | 2021-01-06 | — | — | EP | claimed |
| CN-112055728-A | Particulate stabilizer composition for polymer resins and process for producing the same | 塞特工业公司 | 2020-12-08 | — | — | CN | claimed |
| CN-111116982-A | Stabilizer composition and method for protecting organic materials from UV light and thermal degradation using the same | 塞特工业公司 | 2020-05-08 | — | — | CN | claimed |
| US-20190264084-A1 | GRANULAR STABILIZER COMPOSITIONS FOR USE IN POLYMER RESINS AND METHODS OF MAKING SAME | CYTEC INDUSTRIES INC. (US) | 2019-08-29 | — | — | US | claimed |
| EP-3221393-A1 | STABILIZER COMPOSITIONS AND METHODS FOR USING SAME FOR PROTECTING ORGANIC MATERIALS FROM UV LIGHT AND THERMAL DEGRADATION | Cytec Industries Inc. (US) | 2017-09-27 | — | — | EP | claimed |
| WO-2016081823-A1 | STABILIZER COMPOSITIONS AND METHODS FOR USING SAME FOR PROTECTING ORGANIC MATERIALS FROM UV LIGHT AND THERMAL DEGRADATION | CYTEC INDUSTRIES INC. (US) | 2016-05-26 | — | — | WO | claimed |
| US-20160145427-A1 | STABILIZER COMPOSITIONS AND METHODS FOR USING SAME FOR PROTECTING ORGANIC MATERIALS FROM UV LIGHT AND THERMAL DEGRADATION | CYTEC INDUSTRIES INC. | 2016-05-26 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260146144-A1 | SYNERGISTIC STABILIZER COMPOSITIONS AND METHODS FOR USING SAME FOR PROTECTING ORGANIC MATERIALS FROM UV LIGHT AND THERMAL DEGRADATION | RAD52, XRCC6, RAD23B | KDM4E 984/4885HPGD 517/4885MAPT 2153/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.