Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 4/20 | 0.62 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.62 |
| ▸ | MAPT | P10636 | 4/20 | 0.62 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.62 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.62 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.62 |
| ▸ | RECQL | P46063 | 2/20 | 0.62 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.56 |
| ▸ | LMNA | P02545 | 3/20 | 0.56 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.56 |
| ▸ | PLK1 | P53350 | 2/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.50 |
| ▸ | MEN1 | O00255 | 2/20 | 0.50 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | PGR | P06401 | 1/20 | 0.50 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.50 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.50 |
| ▸ | PDE4A | P27815 | 1/20 | 0.50 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2486188 | 1.00 | HPGD (0.62) | HPGDKDM4EMAPTALDH1A1ALOX15 | |
| SCHEMBL20496479 | 1.00 | HPGD (0.62) | HPGDKDM4EMAPTALDH1A1ALOX15 | |
| SCHEMBL20496460 | 0.96 | HPGD (0.56) | HPGDKDM4EMAPTALDH1A1ALOX15 | |
| SCHEMBL29415041 | 0.94 | HPGD (0.62) | HPGDKDM4EMAPTALDH1A1ALOX15 | |
| SCHEMBL20496448 | 0.94 | HPGD (0.62) | HPGDKDM4EMAPTALDH1A1ALOX15 | |
| SCHEMBL2484859 | 0.94 | HPGD (0.62) | HPGDKDM4EMAPTALDH1A1ALOX15 | |
| SCHEMBL20496429 | 0.93 | HPGD (0.54) | HPGDKDM4EMAPTALDH1A1ALOX15 | |
| SCHEMBL20496476 | 0.93 | HPGD (0.54) | HPGDKDM4EMAPTALDH1A1ALOX15 | |
| SCHEMBL2488063 | 0.93 | KDM4E (0.70) | HPGDKDM4EMAPTALDH1A1ALOX15 | |
| SCHEMBL29415019 | 0.93 | KDM4E (0.70) | HPGDKDM4EMAPTALDH1A1ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120092045-A | Synergistic stabilizer composition and method for protecting organic material from UV rays and thermal degradation using the same | 塞特工业公司 | 2025-06-03 | — | — | CN | claimed |
| EP-4363506-A1 | COMPOSITIONS AND METHODS FOR PROTECTING COATINGS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT | Cytec Industries Inc. (US) | 2024-05-08 | — | — | EP | claimed |
| CN-117597403-A | Composition and method for protecting a coating from harmful effects of exposure to UV-C light | 塞特工业公司 | 2024-02-23 | — | — | CN | claimed |
| EP-4251689-A1 | COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT | Cytec Industries, Inc. (US) | 2023-10-04 | — | — | EP | claimed |
| CN-116783246-A | Compositions and methods for protecting organic polymeric materials from discoloration due to exposure to UV-C light | 塞特工业公司 | 2023-09-19 | — | — | CN | claimed |
| WO-2023278282-A1 | COMPOSITIONS AND METHODS FOR PROTECTING COATINGS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT | CYTEC INDUSTRIES INC. (US) | 2023-01-05 | — | — | WO | claimed |
| WO-2022115573-A1 | COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT | CYTEC INDUSTRIES INC. (US) | 2022-06-02 | — | — | WO | claimed |
| WO-2022115578-A1 | COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM THE DELETERIOUS EFFECTS EXPOSURE TO UV-C LIGHT | CYTEC INDUSTRIES INC. (US) | 2022-06-02 | — | — | WO | claimed |
| CN-120092045-A | Synergistic stabilizer composition and method for protecting organic material from UV rays and thermal degradation using the same | 塞特工业公司 | 2025-06-03 | — | — | CN | disclosed |
| WO-2025099143-A1 | COMPOSITIONS FOR STABILIZING POLYMERIC MATERIALS AGAINST UV LIGHT THERMAL AND GAS FADING DEGRADATION | CYTEC INDUSTRIES INC. (US) | 2025-05-15 | — | — | WO | disclosed |
| WO-2025099141-A1 | STABILIZING COMPOSITIONS FOR POLYMERIC MATERIALS | CYTEC INDUSTRIES INC. (US) | 2025-05-15 | — | — | WO | disclosed |
| WO-2025056330-A1 | STABILIZED POLYMER COMPOSITIONS WITH IMPROVED COLOR RESISTANCE | CYTEC INDUSTRIES INC. (US) | 2025-03-20 | — | — | WO | disclosed |
| EP-4457069-A1 | POLYMER COMPOSITIONS HAVING DENSIFICATION ACCELERATORS AND ROTATIONAL MOLDING PROCESSES FOR MAKING HOLLOW ARTICLES THEREFROM | Cytec Industries Inc. (US) | 2024-11-06 | — | — | EP | disclosed |
| CN-118591450-A | Polymer composition with densification promoter and rotational molding method for manufacturing hollow article therefrom | 塞特工业公司 | 2024-09-03 | — | — | CN | disclosed |
| CN-112055728-B | Granular stabilizer composition for polymer resin and method for producing the same | 塞特工业公司 | 2023-05-05 | — | — | CN | disclosed |
| WO-2023278282-A1 | COMPOSITIONS AND METHODS FOR PROTECTING COATINGS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT | CYTEC INDUSTRIES INC. (US) | 2023-01-05 | — | — | WO | disclosed |
| CN-115368629-A | Stabilizer composition and method for protecting organic materials from UV light and thermal degradation using the same | 塞特工业公司 | 2022-11-22 | — | — | CN | disclosed |
| WO-2022115578-A1 | COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM THE DELETERIOUS EFFECTS EXPOSURE TO UV-C LIGHT | CYTEC INDUSTRIES INC. (US) | 2022-06-02 | — | — | WO | disclosed |
| WO-2022115573-A1 | COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT | CYTEC INDUSTRIES INC. (US) | 2022-06-02 | — | — | WO | disclosed |
| CN-110291122-B | Polymerizable composition for optical material, optical material obtained from the composition, and plastic lens | 三井化学株式会社 | 2022-03-01 | — | — | CN | disclosed |