Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7108890 | 1.00 | TSHR (0.30) | TSHRAPEX1 | |
| SCHEMBL7818689 | 0.88 | — | — | |
| SCHEMBL14954972 | 0.88 | APEX1 (0.33) | APEX1 | |
| SCHEMBL8989593 | 0.79 | ALDH1A1 (0.35) | — | |
| SCHEMBL13902818 | 0.78 | — | — | |
| SCHEMBL92928 | 0.78 | — | — | |
| SCHEMBL1484545 | 0.78 | — | — | |
| SCHEMBL10711884 | 0.75 | — | — | |
| SCHEMBL1794941 | 0.75 | — | — | |
| SCHEMBL3604084 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 93 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6929901-B2 | Method for reworking a lithographic process to provide an undamaged and residue free arc layer | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2005-08-16 | — | — | US | claimed |
| US-20040121269-A1 | Method for reworking a lithographic process to provide an undamaged and residue free arc layer | TAIWAN SEMICONDUCTOR MANUFACTURING CO.; LTD. | 2004-06-24 | — | — | US | claimed |
| US-20040086786-A1 | Radiation correction method for electron beam lithography | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY | 2004-05-06 | — | — | US | claimed |
| EP-0530204-B1 | DISPERSANT COMPOSITIONS FOR SUBTERRANEAN WELL DRILLING AND COMPLETION | ATLANTIC RICHFIELD CO (US) | 1996-07-17 | — | — | EP | claimed |
| EP-0264650-B1 | ANTI-REFLECTIVE COATING | Brewer Science, Inc. (US) | 1992-08-26 | — | — | EP | claimed |
| EP-0264650-A1 | Anti-reflective coating | Brewer Science, Inc. (US) | 1988-04-27 | — | — | EP | claimed |
| EP-0070198-A1 | Radiation-sensitive composition and pattern-formation method using the same | Hitachi, Ltd. (JP) | 1983-01-19 | — | — | EP | claimed |
| JP-55090950-A | — | — | None | — | — | JP | disclosed |
| JP-2072361-A | — | — | None | — | — | JP | disclosed |
| CN-116298309-B | High throughput cloning of paired bipartite immunoreceptor polynucleotides and uses thereof | 根路径基因组学公司 | 2024-04-02 | — | — | CN | disclosed |
| CN-116298309-A | High throughput cloning of paired bipartite immunoreceptor polynucleotides and uses thereof | 根路径基因组学公司 | 2023-06-23 | — | — | CN | disclosed |
| CN-116144706-A | High throughput cloning of paired bipartite immunoreceptor polynucleotides and uses thereof | 根路径基因组学公司 | 2023-05-23 | — | — | CN | disclosed |
| CN-112840031-B | High throughput cloning and use of paired bipartite immunoreceptor polynucleotides | 根路径基因组学公司 | 2023-03-24 | — | — | CN | disclosed |
| US-4439514-A | Photoresistive compositions | UNIVERSITY PATENTS, INC. (US) | 1984-03-27 | — | — | US | disclosed |
| US-4383026-A | Accelerated particle lithographic processing and articles so produced | BELL TELEPHONE LABORATORIES, INCORPORATED (US) | 1983-05-10 | — | — | US | disclosed |
| US-4357616-A | Recording medium | HITACHI, LTD. (JP) | 1982-11-02 | — | — | US | disclosed |
| EP-0061939-A2 | The provision of conductors in electronic devices | FUJITSU LIMITED (JP) | 1982-10-06 | — | — | EP | disclosed |
| US-4278754-A | Resists and method of manufacturing semiconductor elements by using the same | OKI ELECTRIC INDUSTRY CO., LTD. (JP) | 1981-07-14 | — | — | US | disclosed |
| JP-S5590950-A | PRODUCTION OF SEMICONDUCTOR DEVICE | FUJITSU LTD | 1980-07-10 | — | — | JP | disclosed |
| JP-S05590950-A | — | — | 0001-01-01 | — | — | JP | disclosed |