SCHEMBL24918345

SCHEMBL24918345

C=CC(=O)OCC(O)COc1ccc(Cc2ccc(OCC(O)COC(C)O)cc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.43
POLB P06746 2/20 0.43
MAPT P10636 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
CYP1A2 P05177 2/20 0.41
TSHR P16473 2/20 0.41
TDP1 Q9NUW8 2/20 0.39
ADRB2 P07550 2/20 0.39
ADRB1 P08588 2/20 0.39
CNR1 P21554 1/20 0.39
ADRA1D P25100 1/20 0.39
ADRA1A P35348 1/20 0.39
ADRA1B P35368 1/20 0.39
KDM4E B2RXH2 1/20 0.39
GLA P06280 1/20 0.39
CYP3A4 P08684 1/20 0.39
NFKB1 P19838 1/20 0.39
THPO P40225 1/20 0.39
BLM P54132 1/20 0.39
PMP22 Q01453 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2127664 0.91 CYP1A2 (0.48) LMNAPOLBMAPTNPSR1CYP1A2
SCHEMBL17171612 0.88 NPSR1 (0.44) LMNAPOLBMAPTNPSR1CYP1A2
SCHEMBL24571175 0.83 POLB (0.48) LMNAPOLBMAPTNPSR1CYP1A2
SCHEMBL24089382 0.81 CYP1A2 (0.45) LMNAPOLBMAPTNPSR1CYP1A2
SCHEMBL9244574 0.81 THRB (0.61) LMNAPOLBMAPTNPSR1CYP1A2
SCHEMBL10630810 0.81 THRB (0.49) LMNAPOLBMAPTNPSR1CYP1A2
SCHEMBL13205122 0.81 CYP1A2 (0.49) LMNAPOLBMAPTNPSR1CYP1A2
SCHEMBL2121270 0.80 POLB (0.50) LMNAPOLBMAPTNPSR1CYP1A2
SCHEMBL2128155 0.80 CYP1A2 (0.50) LMNAPOLBMAPTNPSR1CYP1A2
SCHEMBL818941 0.80 CYP1A2 (0.50) LMNAPOLBMAPTNPSR1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4122964-A1 NOVOLAC RESIN, EPOXY RESIN, PHOTOSENSITIVE RESIN COMPOSITION, CURABLE RESIN COMPOSITION, CURED PRODUCT, ELECTRONIC DEVICE, METHOD FOR PRODUCING NOVOLAC RESIN, AND METHOD FOR PRODUCING EPOXY RESIN Central Glass Company, Limited (JP) 2023-01-25 EP disclosed