SCHEMBL2493088

SCHEMBL2493088

C=CC(O)n1c(=O)[nH]c(=O)[nH]c1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11596094 0.83 CYP3A4 (0.30) —
SCHEMBL29172397 0.75 — —
SCHEMBL5605852 0.74 POLB (0.32) —
SCHEMBL278681 0.74 CYP3A4 (0.31) —
SCHEMBL11757540 0.74 LMNA (0.30) —
SCHEMBL11768003 0.71 POLB (0.58) —
SCHEMBL4877997 0.70 — —
SCHEMBL9052845 0.70 POLB (0.35) —
SCHEMBL10715516 0.68 — —
SCHEMBL5605627 0.67 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117887328-A Anti-reflection coating composition, preparation method and application 福建泓光半导体材料有限公司 2024-04-16 — — CN claimed
CN-117866174-A Aromatic thio epoxy resin, preparation method and application 福建泓光半导体材料有限公司 2024-04-12 — — CN claimed
CN-113677718-B Radiation curable compositions for rapid prototyping or rapid manufacturing processes 古莎有限公司 2023-12-01 — — CN claimed
EP-3923853-A1 RADIATION-CURABLE COMPOSITION FOR USE IN RAPID PROTOTYPING OR RAPID MANUFACTURING METHODS Kulzer GmbH (DE) 2021-12-22 — — EP claimed
CN-113677718-A Radiation curable compositions for rapid prototyping or rapid manufacturing processes 古莎有限公司 2021-11-19 — — CN claimed
WO-2020182810-A1 RADIATION-CURABLE COMPOSITION FOR USE IN RAPID PROTOTYPING OR RAPID MANUFACTURING METHODS KULZER GMBH (DE) 2020-09-17 — — WO claimed
US-9714364-B2 Photo-curable resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-07-25 — — US claimed
US-20140235746-A1 PHOTO-CURABLE RESIN COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-08-21 — — US claimed
EP-2762517-A1 LIGHT-CURING RESIN COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2014-08-06 — — EP claimed
US-5096961-A Ammonium polyphosphate and bis/triazinyl/piperazine as fireproofing synergist HOECHST AKTIENGESELLSCHAFT (DE) 1992-03-17 — — US claimed
US-4826983-A TRIMETHALLYL ISOCYANURATE WITH AN ALKYLPHENOL ICI AMERICAS INC. (US) 1989-05-02 — — US claimed
JP-10298327-A — — None — — JP disclosed
CN-117887328-A Anti-reflection coating composition, preparation method and application 福建泓光半导体材料有限公司 2024-04-16 — — CN disclosed
CN-117887328-A Anti-reflection coating composition, preparation method and application 福建泓光半导体材料有限公司 2024-04-16 — — CN disclosed
CN-117866174-A Aromatic thio epoxy resin, preparation method and application 福建泓光半导体材料有限公司 2024-04-12 — — CN disclosed
WO-1990009418-A1 IMPROVED INTUMESCENT FLAME RETARDANT SYSTEMS HOECHST CELANESE CORPORATION (US) 1990-08-23 — — WO disclosed
EP-0166774-A1 WATER REDUCING AGENT UTILIZED IN MORTAR AND CONCRETE. SANDOZ LTD (CH) 1986-01-08 — — EP disclosed
WO-1985002838-A1 WATER REDUCING AGENT UTILIZED IN MORTAR AND CONCRETE SANDOZ LTD (CH) 1985-07-04 — — WO disclosed
US-4198493-A FOR POLYOLEFINS AND POLYSTYRENE; AND AMMONIUM PHOSPHATE, A POLYALCOHOL OR NITROGEN COMPOUND (OR AMINO RESIN THEREOF) AND A HYDROXY- OR EPOXYALKYL ISOCYANURATE MONTEDISON S.P.A. (IT) 1980-04-15 — — US disclosed
US-4031040-A Polyurethanes prepared from hydroxymethyl isocyanurates STAMICARBON B.V. (NL) 1977-06-21 — — US disclosed
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