Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.52 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.52 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | TNK2 | Q07912 | 1/20 | 0.46 |
| ▸ | HPGD | P15428 | 3/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.44 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | NPC1 | O15118 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
| ▸ | NR4A2 | P43354 | 2/20 | 0.41 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.40 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.39 |
| ▸ | PLA2G4A | P47712 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24818291 | 0.86 | ALDH1A1 (0.43) | ALDH1A1HSD17B10ALOX15MAPTLMNA | |
| SCHEMBL10338466 | 0.86 | HSD17B10 (0.58) | ALDH1A1HSD17B10ALOX15MAPTTNK2 | |
| SCHEMBL14407363 | 0.86 | NPC1 (0.53) | ALDH1A1HSD17B10ALOX15MAPTLMNA | |
| SCHEMBL24818284 | 0.86 | NPC1 (0.53) | ALDH1A1HSD17B10ALOX15MAPTLMNA | |
| SCHEMBL21310429 | 0.86 | HSD17B10 (0.58) | ALDH1A1HSD17B10ALOX15MAPTTNK2 | |
| SCHEMBL5539118 | 0.83 | BRD4 (0.45) | ALDH1A1HSD17B10ALOX15MAPTLMNA | |
| SCHEMBL2091330 | 0.83 | ALDH1A1 (0.44) | ALDH1A1HSD17B10ALOX15MAPTLMNA | |
| SCHEMBL5539114 | 0.83 | ALDH1A1 (0.44) | ALDH1A1HSD17B10ALOX15MAPTLMNA | |
| SCHEMBL2091326 | 0.83 | ALDH1A1 (0.44) | ALDH1A1HSD17B10ALOX15MAPTLMNA | |
| SCHEMBL12230526 | 0.82 | ALDH1A1 (0.41) | ALDH1A1HSD17B10ALOX15MAPTLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 102 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11352450-B2 | Photopolymerization sensitizer composition | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2022-06-07 | — | — | US | claimed |
| CN-111868105-B | Photopolymerizable sensitizer composition | 川崎化成工业株式会社 | 2022-05-13 | — | — | CN | claimed |
| US-20210079127-A1 | PHOTOPOLYMERIZATION SENSITIZER COMPOSITION | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2021-03-18 | — | — | US | claimed |
| US-8029970-B2 | Composition for manufacturing barrier rib, and plasma display panel manufactured by the same | SAMSUNG SDI CO., LTD. (KR) | 2011-10-04 | — | — | US | claimed |
| US-20080290314-A1 | COMPOSITION FOR MANUFACTURING BARRIER RIB, AND PLASMA DISPLAY PANEL MANUFACTURED BY THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2008-11-27 | — | — | US | claimed |
| EP-0360618-B1 | LIGHT-SENSITIVE COMPOSITION | FUJI PHOTO FILM CO., LTD. (JP) | 1992-12-16 | — | — | EP | claimed |
| EP-0360618-A2 | Light-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1990-03-28 | — | — | EP | claimed |
| JP-2069526-A | — | — | None | — | — | JP | disclosed |
| JP-4224572-A | — | — | None | — | — | JP | disclosed |
| JP-2038426-A | — | — | None | — | — | JP | disclosed |
| EP-4069663-B1 | MATERIALS FOR ORGANIC ELECTROLUMINESCENT DEVICES | MERCK PATENT GMBH (DE) | 2023-12-13 | — | — | EP | disclosed |
| US-11352450-B2 | Photopolymerization sensitizer composition | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2022-06-07 | — | — | US | disclosed |
| CN-111868105-B | Photopolymerizable sensitizer composition | 川崎化成工业株式会社 | 2022-05-13 | — | — | CN | disclosed |
| US-4904563-A | Microcapsules and light-sensitive recording material using the same | FUJI PHOTO FILM CO., LTD. (JP) | 1990-02-27 | — | — | US | disclosed |
| JP-H0238426-A | POLYAMIDE RESIN AND ITS MANUFACTURE | IMAI YOSHIO | 1990-02-07 | — | — | JP | disclosed |
| CN-1006386-B | PROCESS FOR PRODUCTION OF VINYL CHLORIDE POLYMER | SHINETSU CHEM IND CO (JP) | 1990-01-10 | — | — | CN | disclosed |
| US-4766037-A | Photodegradable microcapsules | FUJI PHOTO FILM CO., LTD. (JP) | 1988-08-23 | — | — | US | disclosed |
| CN-85107531-A | Process for producing vinyl chloride polymer | — | 1987-01-21 | — | — | CN | disclosed |
| US-4563413-A | PHOTORESISTS, PRINTING PLATES | HERCULES INCORPORATED (US) | 1986-01-07 | — | — | US | disclosed |
| US-4250053-A | WITH FLUORESCENT COMPOUND | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1981-02-10 | — | — | US | disclosed |