SCHEMBL24943706

SCHEMBL24943706

COc1ccc2cc(O)c(C(=O)OC3(c4ccccc4)CCNCC3)cc2c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 4/20 0.41
RAB9A P51151 4/20 0.41
LMNA P02545 3/20 0.41
MAPT P10636 1/20 0.41
RECQL P46063 1/20 0.41
ATM Q13315 1/20 0.41
ABCG2 Q9UNQ0 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
CYP1A2 P05177 2/20 0.40
PGR P06401 2/20 0.40
HPGD P15428 2/20 0.40
SLC6A2 P23975 2/20 0.40
CYP2C19 P33261 2/20 0.40
ALDH1A1 P00352 2/20 0.40
CYP2D6 P10635 1/20 0.40
PDE4A P27815 1/20 0.40
MAPK1 P28482 1/20 0.40
HRH1 P35367 1/20 0.40
HTT P42858 1/20 0.40
SLC6A3 Q01959 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944227 0.89 MEN1 (0.45) NPC1RAB9ALMNAMAPTRECQL
SCHEMBL26413581 0.89 LMNA (0.49) NPC1RAB9ALMNAMAPTRECQL
SCHEMBL24944936 0.89 SMN1; SMN2 (0.40) NPC1LMNAMAPTHPGDSLC6A2
SCHEMBL24944876 0.88 ESR1 (0.41) NPC1RAB9AMAPTMAPK1MEN1
SCHEMBL26479256 0.86 MEN1 (0.42) MAPTPGRMAPK1MEN1KMT2A
SCHEMBL24944185 0.85 KDM4E (0.46) NPC1RAB9ACYP1A2HPGDCYP2C19
SCHEMBL24943993 0.84 KDM4E (0.48) NPC1RAB9ACYP1A2HPGDCYP2C19
SCHEMBL24944086 0.82 MEN1 (0.40) NPC1RAB9ALMNAMAPTRECQL
SCHEMBL24943720 0.82 KMT2A (0.50) NPC1RAB9ALMNAMAPTABCG2
SCHEMBL24943724 0.82 CYP3A4 (0.46) NPC1RAB9AMAPTABCG2CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR NPC1 4818/4885RAB9A 3924/4885LMNA 2930/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.