SCHEMBL24944005

SCHEMBL24944005

CCCCCCCCCCCCCCCCCCCCCCC(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.47

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 4/20 0.47
DRD3 P35462 2/20 0.46
DRD2 P14416 1/20 0.45
DRD4 P21917 1/20 0.45
OPRD1 P41143 3/20 0.43
OPRK1 P41145 3/20 0.43
CES2 O00748 2/20 0.40
CES1 P23141 2/20 0.40
MMP2 P08253 1/20 0.40
MMP3 P08254 1/20 0.40
MMP9 P14780 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944000 1.00 OPRM1 (0.47) OPRM1DRD3DRD2DRD4OPRD1
SCHEMBL24944837 1.00 OPRM1 (0.47) OPRM1DRD3DRD2DRD4OPRD1
SCHEMBL24944835 1.00 OPRM1 (0.47) OPRM1DRD3DRD2DRD4OPRD1
SCHEMBL24944838 1.00 OPRM1 (0.47) OPRM1DRD3DRD2DRD4OPRD1
SCHEMBL24944002 1.00 OPRM1 (0.47) OPRM1DRD3DRD2DRD4OPRD1
SCHEMBL24944614 1.00 OPRM1 (0.47) OPRM1DRD3DRD2DRD4OPRD1
SCHEMBL24944841 1.00 OPRM1 (0.47) OPRM1DRD3DRD2DRD4OPRD1
SCHEMBL24944001 1.00 OPRM1 (0.47) OPRM1DRD3DRD2DRD4OPRD1
SCHEMBL24944836 1.00 OPRM1 (0.47) OPRM1DRD3DRD2DRD4OPRD1
SCHEMBL24944630 1.00 OPRM1 (0.47) OPRM1DRD3DRD2DRD4OPRD1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885DRD3 1945/4885DRD2 1738/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.