SCHEMBL24944641

SCHEMBL24944641

CC(C)C(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.50

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 6/20 0.50
HDAC1 Q13547 1/20 0.39
HTR2A P28223 1/20 0.38
OPRD1 P41143 3/20 0.36
OPRK1 P41145 3/20 0.36
TACR1 P25103 1/20 0.36
ELANE P08246 1/20 0.36
APOBEC3A P31941 1/20 0.35
APOBEC3G Q9HC16 1/20 0.35
DRD3 P35462 1/20 0.35
SIGMAR1 Q99720 1/20 0.35
ALDH1A1 P00352 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413266 0.90 OPRM1 (0.49) OPRM1HDAC1HTR2AOPRD1OPRK1
SCHEMBL23870803 0.88 OPRM1 (0.48) OPRM1HDAC1HTR2AOPRD1OPRK1
SCHEMBL26478561 0.88 OPRM1 (0.48) OPRM1HDAC1HTR2AOPRD1OPRK1
SCHEMBL25475417 0.88 OPRM1 (0.48) OPRM1HDAC1HTR2AOPRD1OPRK1
SCHEMBL24944576 0.88 OPRM1 (0.48) OPRM1HDAC1HTR2AOPRD1OPRK1
SCHEMBL24944670 0.87 OPRM1 (0.47) OPRM1HDAC1OPRD1OPRK1
SCHEMBL26478569 0.86 OPRM1 (0.46) OPRM1HDAC1HTR2AOPRD1OPRK1
SCHEMBL24944586 0.86 OPRM1 (0.52) OPRM1HDAC1OPRD1OPRK1TACR1
SCHEMBL26478540 0.85 OPRM1 (0.47) OPRM1HDAC1HTR2AOPRD1OPRK1
SCHEMBL24944659 0.85 OPRM1 (0.45) OPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885HDAC1 2046/4885HTR2A 3805/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.