Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 6/20 | 0.56 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.56 |
| ▸ | MEN1 | O00255 | 2/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.56 |
| ▸ | LMNA | P02545 | 1/20 | 0.56 |
| ▸ | RAB9A | P51151 | 1/20 | 0.56 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.56 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.56 |
| ▸ | HPGD | P15428 | 1/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.52 |
| ▸ | GAA | P10253 | 3/20 | 0.52 |
| ▸ | GFER | P55789 | 1/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.52 |
| ▸ | ACHE | P22303 | 1/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.50 |
| ▸ | CES2 | O00748 | 1/20 | 0.50 |
| ▸ | CES1 | P23141 | 1/20 | 0.50 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.50 |
| ▸ | TUBB | P07437 | 1/20 | 0.50 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL61950 | 0.87 | ALDH1A1 (0.58) | MAPTMAPK1MEN1KMT2ALMNA | |
| SCHEMBL19879308 | 0.85 | KMT2A (0.63) | MAPTMAPK1MEN1KMT2ALMNA | |
| Hydrogen Sulfide SCHEMBL6567203 | 0.85 | MAPT (0.56) | MAPTMAPK1MEN1KMT2ALMNA | |
| SCHEMBL6567199 | 0.85 | MAPT (0.56) | MAPTMAPK1MEN1KMT2ALMNA | |
| SCHEMBL6569210 | 0.85 | MAPT (0.56) | MAPTMAPK1MEN1KMT2ALMNA | |
| SCHEMBL1263095 | 0.85 | ALDH1A1 (0.60) | MAPTMAPK1MEN1KMT2ALMNA | |
| SCHEMBL26606109 | 0.85 | ELANE (0.59) | MAPTMEN1KMT2ALMNAHPGD | |
| SCHEMBL11485414 | 0.85 | KMT2A (0.61) | MAPTMAPK1MEN1KMT2ALMNA | |
| SCHEMBL9749949 | 0.84 | MEN1 (0.50) | MAPTMAPK1MEN1KMT2ALMNA | |
| SCHEMBL11477790 | 0.84 | MAPT (0.55) | MAPTMAPK1MEN1KMT2ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8029877-B2 | Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-20100238388-A1 | CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-09-23 | — | — | US | disclosed |
| US-7758930-B2 | Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-07-20 | — | — | US | disclosed |
| US-20090202749-A1 | CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL | HAYASHI SHINJI | 2009-08-13 | — | — | US | disclosed |
| US-7537810-B2 | Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2009-05-26 | — | — | US | disclosed |
| US-20060229376-A1 | Curable resin composition, photosensitive pattern-forming curable resin composition,color filter, substrate for liquid crystalline panel, and liquid crystalline panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2006-10-12 | — | — | US | disclosed |
| US-20060177762-A1 | Negative photosensitive resin composition and negative photosensitive element | HITACHI CHEMICAL CO., LTD. (JP) | 2006-08-10 | — | — | US | disclosed |
| EP-0920645-B1 | NAPHTHOPYRANS, COMPOSITIONS AND ARTICLES CONTAINING THEM | CORNING INC (US) | 2002-04-03 | — | — | EP | disclosed |
| US-6150065-A | 1-(P-AMINOPHENYL)-1,4,4-TRIPHENYLBUTADIENE DERIVATIVE CHARGE TRANSFER COMPOUNDS | TAKASAGO INTERNATIONAL CORPORATION (JP) | 2000-11-21 | — | — | US | disclosed |
| US-6096246-A | POLYMER LENSES WITH RADIATION RESISTANT NAPHTHOPYRAN MIXTURES | CORNING INCORPORATED (US) | 2000-08-01 | — | — | US | disclosed |
| EP-0549228-B1 | Photocurable resin composition | NAT STARCH CHEM INVEST (US) | 1996-08-28 | — | — | EP | disclosed |
| EP-0549228-A2 | Photocurable resin composition | National Starch and Chemical Investment Holding Corporation (US) | 1993-06-30 | — | — | EP | disclosed |
| EP-0254858-B1 | CHROMOGENIC 3,1-BENZOXAZINE | BAYER AG (DE) | 1990-10-31 | — | — | EP | disclosed |
| US-4904637-A | Recording material comprising chromogenic 3,1-benzoxazines | BAYER AKTIENGESELLSCHAFT (DE) | 1990-02-27 | — | — | US | disclosed |
| US-4835270-A | PRESSURE-, HEAT- AND ELECTROSENSITIVE ELEMENTS; ACID DEVELOPERS | BAYER AKTIENGESELLSCHAFT (DE) | 1989-05-30 | — | — | US | disclosed |
| US-4831141-A | PRESSURE SENSITIVE RECORDING | BAYER AKTIENGESELLSCHAFT (DE) | 1989-05-16 | — | — | US | disclosed |
| EP-0187329-B1 | CHROMOGENIC 3,1-BENZOXAZINES | BAYER AG (DE) | 1989-03-08 | — | — | EP | disclosed |
| EP-0084269-B1 | RADIATION-SENSITIVE POLYIMIDE PRECURSOR COMPOSITION DERIVED FROM A DIARYL FLUORO COMPOUND | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-10-28 | — | — | EP | disclosed |
| EP-0187329-A1 | Chromogenic 3,1-benzoxazines | BAYER AG (DE) | 1986-07-16 | — | — | EP | disclosed |
| US-4220356-A | Recording materials containing chromenoindoles | FUJI PHOTO FILM CO., LTD. (JP) | 1980-09-02 | — | — | US | disclosed |