SCHEMBL25008080

SCHEMBL25008080

COc1cccc([SiH](c2cccc(OC)c2)c2cccc(OC)c2)c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE P22303 1/20 0.54
CA1 P00915 1/20 0.52
CA2 P00918 1/20 0.52
CA7 P43166 1/20 0.52
CA9 Q16790 1/20 0.52
ALDH1A1 P00352 1/20 0.52
CYP3A4 P08684 1/20 0.52
CES2 O00748 1/20 0.47
CES1 P23141 1/20 0.47
ENPP2 Q13822 1/20 0.47
CA4 P22748 1/20 0.46
CHRM5 P08912 1/20 0.45
IDO1 P14902 2/20 0.44
AGXT P21549 2/20 0.44
TAAR1 Q96RJ0 2/20 0.44
NPC1 O15118 1/20 0.44
RAB9A P51151 1/20 0.44
PARP1 P09874 1/20 0.44
RELA Q04206 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28088787 0.94 CA4 (0.52) ACHECA1CA2CA7CA9
SCHEMBL27452685 0.84 ACHE (0.52) ACHECA1CA2CA7CA9
SCHEMBL3294227 0.82 ACHE (0.50) ACHECA1CA2CA7CA9
1,3-Dimethoxybenzene SCHEMBL9350 0.79 ACHE (0.70) ACHECA1CA2CA7CA9
1,3-Dimethoxybenzene SCHEMBL901285 0.79 ACHE (0.70) ACHECA1CA2CA7CA9
SCHEMBL27949684 0.77 CA4 (0.48) ALDH1A1CYP3A4CA4NPC1RAB9A
SCHEMBL3299381 0.77 CA4 (0.48) ACHECA1CA2CA7CA9
1,3-Dimethoxybenzene SCHEMBL28542304 0.76 ACHE (0.67) ACHECA1CA2CA7CA9
1,3-Dimethoxybenzene SCHEMBL28343465 0.76 ACHE (0.67) ACHECA1CA2CA7CA9
1,3-Dimethoxybenzene SCHEMBL15870025 0.76 ACHE (0.67) ACHECA1CA2CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4129974-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE FUJIFILM Corporation (JP) 2023-02-08 EP disclosed