SCHEMBL25012009

SCHEMBL25012009

CC(O)COCC(F)(F)C(F)(F)C(F)(F)C(F)F

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.48
NPSR1 Q6W5P4 2/20 0.48
HPGD P15428 1/20 0.48
XBP1 P17861 1/20 0.48
SMN1; SMN2 Q16637 1/20 0.48
L3MBTL1 Q9Y468 1/20 0.48
MAPT P10636 2/20 0.44
MEN1 O00255 1/20 0.44
TP53 P04637 1/20 0.44
HTT P42858 1/20 0.44
KMT2A Q03164 1/20 0.44
HSD17B10 Q99714 1/20 0.36
CYP1A2 P05177 2/20 0.36
CYP2C19 P33261 2/20 0.36
TSHR P16473 2/20 0.36
KDM4E B2RXH2 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
USP2 O75604 1/20 0.33
MAPK1 P28482 1/20 0.33
CYP2C9 P11712 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12826809 0.84 LMNA (0.53) LMNANPSR1HPGDXBP1SMN1; SMN2
SCHEMBL2857643 0.81 LMNA (0.48) LMNANPSR1HPGDXBP1SMN1; SMN2
SCHEMBL11967609 0.81 LMNA (0.46) LMNANPSR1HPGDXBP1SMN1; SMN2
SCHEMBL11967598 0.80 LMNA (0.48) LMNANPSR1HPGDXBP1SMN1; SMN2
SCHEMBL497555 0.80 LMNA (0.43) LMNANPSR1HPGDXBP1SMN1; SMN2
SCHEMBL9488927 0.79 HSD17B10 (0.38) LMNANPSR1HPGDXBP1SMN1; SMN2
SCHEMBL9587790 0.78 CYP1A2 (0.40) LMNANPSR1HPGDXBP1SMN1; SMN2
Hydrochloric Acid SCHEMBL31364520 0.78 LMNA (0.42) LMNANPSR1HPGDXBP1SMN1; SMN2
SCHEMBL2867187 0.76 LMNA (0.44) LMNANPSR1HPGDXBP1SMN1; SMN2
SCHEMBL7155245 0.76 CYP1A2 (0.40) LMNANPSR1HPGDXBP1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023013697-A1 MATERIAL FOR METAL PATTERNING, FLUORO COMPOUND, THIN FILM FOR METAL PATTERNING, ORGANIC ELECTROLUMINESCENCE DEVICE, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2023-02-09 WO disclosed