⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL251017 | 0.80 | — | — | |
| SCHEMBL13070023 | 0.79 | — | — | |
| SCHEMBL9755516 | 0.75 | — | — | |
| SCHEMBL274532 | 0.75 | — | — | |
| SCHEMBL1772792 | 0.75 | — | — | |
| Cyclopropane SCHEMBL8506514 | 0.67 | — | — | |
| SCHEMBL1483936 | 0.65 | MEN1 (0.33) | — | |
| SCHEMBL1481548 | 0.65 | MEN1 (0.33) | — | |
| SCHEMBL1483933 | 0.65 | MEN1 (0.33) | — | |
| SCHEMBL11750463 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220220100-A1 | PHOTOCHROMIC AND ELECTROCHROMIC DIARYLETHENE COMPOUNDS WITH IMPROVED PHOTOSTABILITY AND SOLUBILITY | SWITCH MATERIALS INC. (CA) | 2022-07-14 | — | — | US | disclosed |
| US-20160083398-A1 | DIARYLETHENE COMPOUNDS AND USES THEREOF | SWITCH MATERIALS, INC. (CA) | 2016-03-24 | — | — | US | disclosed |
| US-8399723-B2 | Processes for production and purification of hydrofluoroolefins | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-03-19 | — | — | US | disclosed |
| US-20120004475-A1 | PROCESSES FOR PRODUCTION AND PURIFICATION OF HYDROFLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2012-01-05 | — | — | US | disclosed |
| US-20110118512-A1 | PROCESSES FOR PRODUCTION AND PURIFICATION OF HYDROFLUOROOLEFINS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-05-19 | — | — | US | disclosed |
| US-7897823-B2 | Process for production of azeotrope compositions comprising hydrofluoroolefin and hydrogen fluoride and uses of said azeotrope compositions in separation processes | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-03-01 | — | — | US | disclosed |
| EP-1960336-A1 | PROCESSES FOR PRODUCTION AND PURIFICATION OF HYDROFLUOROOLEFINS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-08-27 | — | — | EP | disclosed |
| WO-2007053178-A1 | PROCESSES FOR PRODUCTION AND PURIFICATION OF HYDROFLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-05-10 | — | — | WO | disclosed |
| US-20060106263-A1 | Processes for production and purification of hydrofluoroolefins | THE CHEMOURS COMPANY FC, LLC | 2006-05-18 | — | — | US | disclosed |
| US-6383403-B1 | USING OCTAFLUOROCYCLOPENTENE AND GENERATING A PLASMA USING INDUCTION OR HELICON WAVE SYSTEM TO ETCH SEMICONDUCTORS; HIGH ETCH SELECTIVITY; DOESN'T FORM POLYMER | JAPAN AS REPRESENTED BY THE DIRECTOR GENERAL OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2002-05-07 | — | — | US | disclosed |
| EP-0964438-A1 | DRY ETCHING METHOD | Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) | 1999-12-15 | — | — | EP | disclosed |
| EP-0948033-A1 | GAS COMPOSITION FOR DRY ETCHING AND PROCESS OF DRY ETCHING | Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) | 1999-10-06 | — | — | EP | disclosed |