SCHEMBL251043

SCHEMBL251043

CCCC(C)P=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8744326 1.00
SCHEMBL8370133 0.82
SCHEMBL7747375 0.82
SCHEMBL408729 0.78 OPRM1 (0.44)
SCHEMBL4707701 0.78 OPRM1 (0.44)
SCHEMBL6189573 0.78 OPRM1 (0.44)
SCHEMBL10495885 0.78 OPRM1 (0.44)
SCHEMBL11266853 0.78 OPRM1 (0.44)
SCHEMBL6717969 0.73
SCHEMBL4871353 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-9169788-A None JP disclosed
CN-104487462-B Photopolymerization method and novel compound used for the same 拉姆博松有限公司 2016-11-23 CN disclosed
CN-104487462-A Photopolymerization method and novel compound used for the same LAMBSON LTD 2015-04-01 CN disclosed
EP-2588549-A1 D1479 STABLE LIQUID BAP PHOTOINITIATOR AND ITS USE IN RADIATION CURABLE COMPOSITIONS DSM IP Assets B.V. (NL) 2013-05-08 EP disclosed
WO-2012003106-A1 D1479 STABLE LIQUID BAP PHOTOINITIATOR AND ITS USE IN RADIATION CURABLE COMPOSITIONS DSM IP ASSETS B.V. (NL) 2012-01-05 WO disclosed
US-7396885-B2 Photo-setting and thermosetting resin composition, process for preparing plugged-through-hole printed wiring board and plugged-through-hole printed wiring board SAN-EI KAGAKU CO., LTD. (JP) 2008-07-08 US disclosed
US-7378556-B2 Process for making thiophosphine compounds ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) 2008-05-27 US disclosed
JP-H09169788-A PRODUCTION OF SECONDARY ARYLPHOSPHINE OXIDE HOECHST AG 1997-06-30 JP disclosed