⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL252911 | 0.83 | — | — | |
| SCHEMBL4828362 | 0.78 | — | — | |
| SCHEMBL250978 | 0.69 | — | — | |
| SCHEMBL7628274 | 0.63 | — | — | |
| SCHEMBL252193 | 0.60 | — | — | |
| SCHEMBL4931013 | 0.59 | — | — | |
| SCHEMBL4865879 | 0.58 | — | — | |
| SCHEMBL7095253 | 0.57 | — | — | |
| SCHEMBL2484961 | 0.57 | — | — | |
| Ammonia Solution, Strong SCHEMBL2317523 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12183591-B2 | Etching gas compositions, methods of forming micropatterns, and methods of manufacturing semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-12-31 | — | — | US | claimed |
| CN-117816109-A | Desulfurizing adsorbent, preparation method and application thereof | 泉州宇极新材料科技有限公司 | 2024-04-05 | — | — | CN | claimed |
| US-20220310407-A1 | ETCHING GAS COMPOSITIONS, METHODS OF FORMING MICROPATTERNS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE | Wonik Materials (KR) | 2022-09-29 | — | — | US | claimed |
| CN-107445794-B | Method for preparing halogenated five-membered cyclic olefin by gas phase isomerization reaction | 北京宇极科技发展有限公司 | 2020-12-04 | — | — | CN | claimed |
| CN-107739294-B | Method for preparing hydrofluorocyclopentene by gas phase dehydrofluorination | 北京宇极科技发展有限公司 | 2020-08-21 | — | — | CN | claimed |
| CN-107365244-B | Method for preparing 1H-perhalo cyclic olefin by hydrogen-halogen exchange reaction through hydrogen source provided by organic solvent | 北京宇极科技发展有限公司 | 2020-05-15 | — | — | CN | claimed |
| EP-2960224-B1 | HIGH-PURITY 1H-HEPTAFLUOROCYCLOPENTENE | ZEON CORP (JP) | 2019-03-27 | — | — | EP | claimed |
| US-9944852-B2 | High-purity 1H-heptafluorocyclopentene | ZEON CORPORATION (JP) | 2018-04-17 | — | — | US | claimed |
| US-9934984-B2 | Hydrofluorocarbon gas-assisted plasma etch for interconnect fabrication | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2018-04-03 | — | — | US | claimed |
| US-20170069508-A1 | HYDROFLUOROCARBON GAS-ASSISTED PLASMA ETCH FOR INTERCONNECT FABRICATION | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2017-03-09 | — | — | US | claimed |
| US-20160002530-A1 | HIGH-PURITY 1H-HEPTAFLUOROCYCLOPENTENE | ZEON CORPORATION (JP) | 2016-01-07 | — | — | US | claimed |
| EP-2960224-A1 | HIGH-PURITY 1H-HEPTAFLUOROCYCLOPENTENE | Zeon Corporation (JP) | 2015-12-30 | — | — | EP | claimed |
| US-20110060170-A1 | METHOD FOR PRODUCING HYDROGEN-CONTAINING FLUOROOLEFIN COMPOUND | ZEON CORPORATION (JP) | 2011-03-10 | — | — | US | claimed |
| CN-119529264-A | Thiol compound containing fluoropolyether group | 大金工业株式会社 | 2025-02-28 | — | — | CN | disclosed |
| US-12183591-B2 | Etching gas compositions, methods of forming micropatterns, and methods of manufacturing semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-12-31 | — | — | US | disclosed |
| CN-115626961-B | Polymers of halogenated alkyl and halogenated alkenyl ether (meth) acrylates | 阿科玛股份有限公司 | 2024-08-13 | — | — | CN | disclosed |
| EP-0913380-A1 | PROCESS FOR THE PREPARATION OF FLUORINATED OLEFIN | Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) | 1999-05-06 | — | — | EP | disclosed |
| EP-0602133-A1 | GEM-DIHYDROPOLYFLUOROALKANES AND MONOHYDROPOLYFLUOROALKENES, PROCESSES FOR THEIR PRODUCTION, AND USE OF GEM-DIHYDROPOLYFLUOROALKANES IN CLEANING COMPOSITIONS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1994-06-22 | — | — | EP | disclosed |
| US-5268122-A | Azeotropic mixture | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-12-07 | — | — | US | disclosed |
| WO-1993005002-A2 | GEM-DIHYDROPOLYFLUOROALKANES AND MONOHYDROPOLYFLUOROALKENES, PROCESSES FOR THEIR PRODUCTION, AND USE OF GEM-DIHYDROPOLYFLUOROALKANES IN CLEANING COMPOSITIONS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-03-18 | — | — | WO | disclosed |