SCHEMBL7095253

SCHEMBL7095253

F[C]1C(F)C(F)(F)C(F)(F)C(F)(F)C1(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4931013 0.92
SCHEMBL4350952 0.79
SCHEMBL252911 0.65
SCHEMBL4865879 0.64
SCHEMBL8514896 0.61
SCHEMBL7632251 0.58
SCHEMBL251182 0.57
SCHEMBL246075 0.57
SCHEMBL332651 0.57
SCHEMBL471760 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024096361-A1 HOLOGRAM RECORDING MEDIUM AND OPTICAL ELEMENT COMPRISING SAME 주식회사 엘지화학 2024-05-10 WO claimed
WO-2024096357-A1 FLUORINE-BASED COMPOUND, PHOTOPOLYMERIZABLE COMPOSITION, HOLOGRAM RECORDING MEDIUM, METHOD FOR MANUFACTURING SAME, AND OPTICAL ELEMENT COMPRISING SAME 주식회사 엘지화학 2024-05-10 WO claimed
WO-2024096357-A1 FLUORINE-BASED COMPOUND, PHOTOPOLYMERIZABLE COMPOSITION, HOLOGRAM RECORDING MEDIUM, METHOD FOR MANUFACTURING SAME, AND OPTICAL ELEMENT COMPRISING SAME 주식회사 엘지화학 2024-05-10 WO disclosed
WO-2024096361-A1 HOLOGRAM RECORDING MEDIUM AND OPTICAL ELEMENT COMPRISING SAME 주식회사 엘지화학 2024-05-10 WO disclosed
US-10023827-B2 Cleaning composition for semiconductor substrate and cleaning method JSR CORPORATION (JP) 2018-07-17 US disclosed
US-20170240851-A1 CLEANING COMPOSITION FOR SEMICONDUCTOR SUBSTRATE AND CLEANING METHOD JSR CORPORATION (JP) 2017-08-24 US disclosed
US-20160032227-A1 CLEANING COMPOSITION FOR SEMICONDUCTOR SUBSTRATE AND CLEANING METHOD JSR CORPORATION (JP) 2016-02-04 US disclosed
US-20150252216-A1 PATTERN-FORMING METHOD AND DIRECTED SELF-ASSEMBLING COMPOSITION JSR CORPORATION (JP) 2015-09-10 US disclosed
US-20030065189-A1 Processes for producing 4-substituted benzopyran derivatives CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2003-04-03 US disclosed
US-6455708-B1 SUCH AS 2,2-BIS(FLUOROMETHYL)-N-(2-CYANOETHYL)-6-TRIFLUOROMETHYL-2H-1-BENZOPYRAN-4 -CARBOXAMIDE; USEFUL AS MEDICINES, AGRICHEMICALS AND COSMETICS, AND CHEMICAL INTERMEDIATES CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2002-09-24 US disclosed
EP-1120412-A1 PROCESSES FOR THE PREPARATION OF 4-SUBSTITUTED BENZOPYRAN DERIVATIVES CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2001-08-01 EP disclosed
US-5618547-A ADMINISTERING PERFLUOROALKYL GROUP-CONTAINING PHENYL PROPANEDIONE DERIVATIVES BRITISH TECHNOLOGY GROUP LIMITED (GB) 1997-04-08 US disclosed
EP-0317275-B1 Control of ectoparasites BRITISH TECH GROUP USA (US) 1994-08-03 EP disclosed
US-4870109-A ANIMAL HUSBANDRY ELI LILLY AND COMPANY (US) 1989-09-26 US disclosed
EP-0317275-A2 Control of ectoparasites BRITISH TECHNOLOGY GROUP USA INC. (US) 1989-05-24 EP disclosed