SCHEMBL25147609

SCHEMBL25147609

C=C1OCC(COC(=O)C(C)(C)CC)O1

nearest known ligand 0.34

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
HMGCR P04035 4/20 0.34
ALDH1A1 P00352 1/20 0.33
L3MBTL1 Q9Y468 2/20 0.32
MAPK1 P28482 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10064414 0.84 HMGCR (0.34) HMGCRALDH1A1L3MBTL1MAPK1
SCHEMBL14368470 0.79 HMGCR (0.32) HMGCRALDH1A1
SCHEMBL13298654 0.79 ALDH1A1 (0.42) ALDH1A1L3MBTL1MAPK1
SCHEMBL47407 0.78 ALDH1A1 (0.49) HMGCRALDH1A1MAPK1
SCHEMBL12134668 0.76 ALDH1A1 (0.37) ALDH1A1L3MBTL1MAPK1
SCHEMBL14094292 0.76 HMGCR (0.38) HMGCRALDH1A1
SCHEMBL10820212 0.76 LPAR1 (0.30) L3MBTL1MAPK1
SCHEMBL23586316 0.75 ALDH1A1 (0.63) ALDH1A1L3MBTL1MAPK1
SCHEMBL15113809 0.73 HMGCR (0.36) HMGCR
SCHEMBL10820215 0.73 SMN1; SMN2 (0.31) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4166537-A1 ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND FUJIFILM Corporation (JP) 2023-04-19 EP disclosed