SCHEMBL2516264

SCHEMBL2516264

O=C1c2cc3ccccc3cc2C(=O)c2cc3ccccc3cc21.c1ccc2cc3cc4cc5ccccc5cc4cc3cc2c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.50
KMT2A Q03164 3/20 0.50
CDC25B P30305 1/20 0.50
BCL2 P10415 1/20 0.48
MCL1 Q07820 1/20 0.48
NPC1 O15118 4/20 0.47
RAB9A P51151 4/20 0.47
ALDH1A1 P00352 5/20 0.44
CASP1 P29466 4/20 0.44
CASP7 P55210 4/20 0.44
MAPK1 P28482 4/20 0.44
CYP3A4 P08684 3/20 0.44
TP53 P04637 3/20 0.44
SMN1; SMN2 Q16637 3/20 0.44
TSHR P16473 2/20 0.44
TDP1 Q9NUW8 2/20 0.44
GSTP1 P09211 1/20 0.44
PABPC1 P11940 1/20 0.44
DNMT1 P26358 1/20 0.44
ELANE P08246 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL54876 1.00 MEN1 (0.50) MEN1KMT2ACDC25BBCL2MCL1
SCHEMBL10057987 1.00 MEN1 (0.50) MEN1KMT2ACDC25BBCL2MCL1
SCHEMBL652915 0.95 MEN1 (0.60) MEN1KMT2ACDC25BBCL2MCL1
SCHEMBL354514 0.94 MEN1 (0.56) MEN1KMT2ACDC25BBCL2MCL1
SCHEMBL29364188 0.94 MEN1 (0.56) MEN1KMT2ACDC25BBCL2MCL1
SCHEMBL30130196 0.94 MEN1 (0.56) MEN1KMT2ACDC25BBCL2MCL1
SCHEMBL29634145 0.92 MEN1 (0.53) MEN1KMT2ACDC25BBCL2MCL1
SCHEMBL30458681 0.92 MEN1 (0.53) MEN1KMT2ACDC25BBCL2MCL1
SCHEMBL16144676 0.92 MEN1 (0.53) MEN1KMT2ACDC25BBCL2MCL1
Ammonia Solution, Strong SCHEMBL28255083 0.92 MEN1 (0.53) MEN1KMT2ACDC25BBCL2MCL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8030124-B2 Method for patterning an organic material to concurrently form an insulator and a semiconductor and device formed thereby CREATOR TECHNOLOGY B.V. (NL) 2011-10-04 US disclosed
US-20080246024-A1 Method For Patterning An Organic Material To Concurrently Form An Insulator And A Semiconductor And Device Formed Thereby KONINKLIJKE PHILIPS ELECTRONICS, N.V. (NL) 2008-10-09 US disclosed