⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL251425 | 0.92 | — | — | |
| SCHEMBL252789 | 0.90 | — | — | |
| SCHEMBL1690467 | 0.84 | — | — | |
| SCHEMBL1690465 | 0.84 | — | — | |
| SCHEMBL250533 | 0.83 | — | — | |
| SCHEMBL2339588 | 0.82 | — | — | |
| SCHEMBL1690427 | 0.82 | — | — | |
| SCHEMBL2339592 | 0.82 | — | — | |
| SCHEMBL1690426 | 0.82 | — | — | |
| SCHEMBL2058503 | 0.80 | THRB (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117222190-B | Application of decafluorohexene in two-phase immersion cooling system | 超聚变数字技术有限公司 | 2024-08-27 | — | — | CN | claimed |
| CN-117222190-A | Application of decafluorohexene in two-phase immersion cooling system | 超聚变数字技术有限公司 | 2023-12-12 | — | — | CN | claimed |
| US-20250343048-A1 | ETCHING METHOD | RESONAC CORPORATION (JP) | 2025-11-06 | — | — | US | disclosed |
| EP-4481794-A1 | ETCHING METHOD | Resonac Corporation (JP) | 2024-12-25 | — | — | EP | disclosed |
| CN-117222190-B | Application of decafluorohexene in two-phase immersion cooling system | 超聚变数字技术有限公司 | 2024-08-27 | — | — | CN | disclosed |
| CN-117222190-B | Application of decafluorohexene in two-phase immersion cooling system | 超聚变数字技术有限公司 | 2024-08-27 | — | — | CN | disclosed |
| CN-117222190-B | Application of decafluorohexene in two-phase immersion cooling system | 超聚变数字技术有限公司 | 2024-08-27 | — | — | CN | disclosed |
| CN-117222190-A | Application of decafluorohexene in two-phase immersion cooling system | 超聚变数字技术有限公司 | 2023-12-12 | — | — | CN | disclosed |
| CN-117222190-A | Application of decafluorohexene in two-phase immersion cooling system | 超聚变数字技术有限公司 | 2023-12-12 | — | — | CN | disclosed |
| CN-117222190-A | Application of decafluorohexene in two-phase immersion cooling system | 超聚变数字技术有限公司 | 2023-12-12 | — | — | CN | disclosed |
| EP-3615500-B1 | METHOD FOR THE PRODUCTION AND PURIFICATION OF 2,3,3,3-TETRAFLUOROPROPENE | ARKEMA FRANCE (FR) | 2021-03-24 | — | — | EP | disclosed |
| WO-2018197788-A1 | METHOD FOR THE PRODUCTION AND PURIFICATION OF 2,3,3,3-TETRAFLUOROPROPENE | ARKEMA FRANCE (FR) | 2018-11-01 | — | — | WO | disclosed |
| US-8399723-B2 | Processes for production and purification of hydrofluoroolefins | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-03-19 | — | — | US | disclosed |
| US-20120004475-A1 | PROCESSES FOR PRODUCTION AND PURIFICATION OF HYDROFLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2012-01-05 | — | — | US | disclosed |
| US-20110118512-A1 | PROCESSES FOR PRODUCTION AND PURIFICATION OF HYDROFLUOROOLEFINS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-05-19 | — | — | US | disclosed |
| US-7897823-B2 | Process for production of azeotrope compositions comprising hydrofluoroolefin and hydrogen fluoride and uses of said azeotrope compositions in separation processes | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-03-01 | — | — | US | disclosed |
| EP-1960336-A1 | PROCESSES FOR PRODUCTION AND PURIFICATION OF HYDROFLUOROOLEFINS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-08-27 | — | — | EP | disclosed |
| WO-2007053178-A1 | PROCESSES FOR PRODUCTION AND PURIFICATION OF HYDROFLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-05-10 | — | — | WO | disclosed |
| US-20060106263-A1 | Processes for production and purification of hydrofluoroolefins | THE CHEMOURS COMPANY FC, LLC | 2006-05-18 | — | — | US | disclosed |
| US-20020182876-A1 | Semiconductor device fabrication method and apparatus | MITSUBISHI DENKI KABUSHIKI KAISHA | 2002-12-05 | — | — | US | disclosed |