Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC3 | O15379 | 1/20 | 0.64 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.64 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.64 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.64 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.64 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.64 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.64 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.64 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.64 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.64 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.64 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.64 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.64 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.64 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.64 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.59 |
| ▸ | FFAR1 | O14842 | 5/20 | 0.59 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.57 |
| ▸ | LTB4R | Q15722 | 1/20 | 0.55 |
| ▸ | MAPT | P10636 | 1/20 | 0.55 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL284671 | 0.96 | SMN1; SMN2 (0.69) | HDAC3MAPK1ADRA1AHDAC4SLC6A3 | |
| Hydroxyphenyl Propionic Acid SCHEMBL35486 | 0.92 | FFAR1 (0.68) | MAPK1HDAC2HDAC8HSD17B10FFAR1 | |
| SCHEMBL418561 | 0.90 | MAPT (0.68) | HDAC3MAPK1ADRA1AHDAC4SLC6A3 | |
| Hydroxyphenyl Propionic Acid SCHEMBL5606896 | 0.90 | FFAR1 (0.65) | MAPK1HDAC2HDAC8HSD17B10FFAR1 | |
| Hydroxyphenyl Propionic Acid SCHEMBL10712090 | 0.90 | FFAR1 (0.65) | MAPK1HDAC2HDAC8HSD17B10FFAR1 | |
| Hydroxyphenyl Propionic Acid SCHEMBL18263865 | 0.90 | FFAR1 (0.65) | MAPK1HDAC2HDAC8HSD17B10FFAR1 | |
| Hydroxyphenyl Propionic Acid SCHEMBL28184441 | 0.90 | FFAR1 (0.65) | MAPK1HDAC2HDAC8HSD17B10FFAR1 | |
| SCHEMBL1832377 | 0.88 | MAPT (0.71) | HDAC3MAPK1ADRA1AHDAC4SLC6A3 | |
| SCHEMBL31522354 | 0.88 | MAPT (0.71) | HDAC3MAPK1ADRA1AHDAC4SLC6A3 | |
| SCHEMBL9138858 | 0.88 | MAPT (0.71) | HDAC3MAPK1ADRA1AHDAC4SLC6A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2618216-B1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIST PATTERN, AND ELECTRONIC COMPONENT | HITACHI CHEMICAL CO LTD (JP) | 2019-05-29 | — | — | EP | disclosed |
| US-9786576-B2 | Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device | HITACHI CHEMICAL COMPANY, LTD (JP) | 2017-10-10 | — | — | US | disclosed |
| US-8836089-B2 | Positive photosensitive resin composition, method of creating resist pattern, and electronic component | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| EP-2221666-B1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCTION OF RESIST PATTERN, AND SEMICONDUCTOR DEVICE | HITACHI CHEMICAL CO LTD (JP) | 2013-09-18 | — | — | EP | disclosed |
| EP-2618216-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIST PATTERN, AND ELECTRONIC COMPONENT | Hitachi Chemical Co., Ltd. (JP) | 2013-07-24 | — | — | EP | disclosed |
| US-20130168859-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIST PATTERN, AND ELECTRONIC COMPONENT | RESONAC CORPORATION (JP) | 2013-07-04 | — | — | US | disclosed |
| US-20110250396-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCTION OF RESIST PATTERN, SEMICONDUCTOR DEVICE, AND ELECTRONIC DEVICE | RESONAC CORPORATION (JP) | 2011-10-13 | — | — | US | disclosed |
| EP-2221666-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCTION OF RESIST PATTERN, SEMICONDUCTOR DEVICE, AND ELECTRONIC DEVICE | Hitachi Chemical Company, Ltd. (JP) | 2010-08-25 | — | — | EP | disclosed |