⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL250936 | 0.74 | — | — | |
| SCHEMBL252193 | 0.74 | — | — | |
| SCHEMBL4337864 | 0.71 | — | — | |
| SCHEMBL7466792 | 0.63 | — | — | |
| SCHEMBL2029571 | 0.59 | — | — | |
| SCHEMBL7466796 | 0.57 | — | — | |
| SCHEMBL4865879 | 0.57 | — | — | |
| SCHEMBL3367777 | 0.56 | — | — | |
| SCHEMBL6411877 | 0.54 | — | — | |
| SCHEMBL23159 | 0.52 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-10045732-A | — | — | None | — | — | JP | disclosed |
| CN-111816559-B | Chemical for TSV/MEMS/power device etching | 乔治洛德方法研究和开发液化空气有限公司 | 2024-06-11 | — | — | CN | disclosed |
| CN-111816559-A | Chemistry for TSV/MEMS/power device etching | 乔治洛德方法研究和开发液化空气有限公司 | 2020-10-23 | — | — | CN | disclosed |
| CN-106663624-B | Chemistry for TSV/MEMS/power device etching | 乔治洛德方法研究和开发液化空气有限公司 | 2020-08-14 | — | — | CN | disclosed |
| US-10720335-B2 | Chemistries for TSV/MEMS/power device etching | AMERICAN AIR LIQUIDE, INC. (US) | 2020-07-21 | — | — | US | disclosed |
| US-20180366336-A1 | CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING | AIR LIQUIDE AMERICAN (US) | 2018-12-20 | — | — | US | disclosed |
| US-10103031-B2 | Chemistries for TSV/MEMS/power device etching | L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Georges Claude (FR) | 2018-10-16 | — | — | US | disclosed |
| US-20180076046-A1 | CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING | AIR LIQUIDE AMERICAN (US) | 2018-03-15 | — | — | US | disclosed |
| US-9892932-B2 | Chemistries for TSV/MEMS/power device etching | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2018-02-13 | — | — | US | disclosed |
| EP-3158579-A1 | CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING | L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2017-04-26 | — | — | EP | disclosed |
| US-20170103901-A1 | CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING | AMERICAN AIR LIQUIDE, INC. (US) | 2017-04-13 | — | — | US | disclosed |
| CN-105237331-A | Method for preparing trichloro and pentafluoro cyclopentene isomeride at same time | BEIJING YUJI SCIENCE & TECHNOLOGY CO LTD | 2016-01-13 | — | — | CN | disclosed |
| US-8399723-B2 | Processes for production and purification of hydrofluoroolefins | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-03-19 | — | — | US | disclosed |
| US-20120004475-A1 | PROCESSES FOR PRODUCTION AND PURIFICATION OF HYDROFLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2012-01-05 | — | — | US | disclosed |
| US-20110118512-A1 | PROCESSES FOR PRODUCTION AND PURIFICATION OF HYDROFLUOROOLEFINS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-05-19 | — | — | US | disclosed |
| US-7897823-B2 | Process for production of azeotrope compositions comprising hydrofluoroolefin and hydrogen fluoride and uses of said azeotrope compositions in separation processes | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-03-01 | — | — | US | disclosed |
| EP-1960336-A1 | PROCESSES FOR PRODUCTION AND PURIFICATION OF HYDROFLUOROOLEFINS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-08-27 | — | — | EP | disclosed |
| WO-2007053178-A1 | PROCESSES FOR PRODUCTION AND PURIFICATION OF HYDROFLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-05-10 | — | — | WO | disclosed |
| US-20060106263-A1 | Processes for production and purification of hydrofluoroolefins | THE CHEMOURS COMPANY FC, LLC | 2006-05-18 | — | — | US | disclosed |
| JP-H1045732-A | DIARYLETHENE DERIVATIVE AND PHOTOCHROMIC MATERIAL USING THE SAME | IRIE MASAHIRO | 1998-02-17 | — | — | JP | disclosed |