⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29085711 | 0.92 | — | — | |
| SCHEMBL7102827 | 0.84 | — | — | |
| SCHEMBL5552263 | 0.79 | GRIN1 (0.31) | — | |
| SCHEMBL2119153 | 0.76 | — | — | |
| SCHEMBL29082263 | 0.75 | — | — | |
| SCHEMBL10387800 | 0.74 | — | — | |
| SCHEMBL28430938 | 0.73 | — | — | |
| SCHEMBL11080256 | 0.69 | HSD11B1 (0.31) | — | |
| SCHEMBL297374 | 0.68 | — | — | |
| SCHEMBL94184 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 141 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240258111-A1 | Surface Treatment Compositions and Methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2024-08-01 | — | — | US | claimed |
| CN-111757896-B | Method for preparing solid catalyst | 博里利斯股份公司 | 2023-10-13 | — | — | CN | claimed |
| CN-111565859-B | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2022-12-30 | — | — | CN | claimed |
| US-11447642-B2 | Methods of using surface treatment compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2022-09-20 | — | — | US | claimed |
| US-11174394-B2 | Surface treatment compositions and articles containing same | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2021-11-16 | — | — | US | claimed |
| EP-3830196-A1 | SURFACE TREATMENT COMPOSITIONS AND METHODS | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2021-06-09 | — | — | EP | claimed |
| US-20210122925-A1 | METHODS OF USING SURFACE TREATMENT COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2021-04-29 | — | — | US | claimed |
| EP-1457802-B1 | Micro-mirror device including dielectrophoretic liquid | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2021-03-17 | — | — | EP | claimed |
| CN-112513192-A | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2021-03-16 | — | — | CN | claimed |
| EP-3735325-A1 | SURFACE TREATMENT COMPOSITIONS AND METHODS | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2020-11-11 | — | — | EP | claimed |
| US-20070077782-A1 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077353-A1 | Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077781-A1 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMTED (JP) | 2007-04-05 | — | — | US | claimed |
| WO-2006091264-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2006-08-31 | — | — | WO | claimed |
| US-20050215072-A1 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2005-09-29 | — | — | US | claimed |
| US-6924922-B2 | Micro-mirror device including dielectrophoretic liquid | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2005-08-02 | — | — | US | claimed |
| US-20050088767-A1 | Micro-Mirror device including dielectrophoretic liquid | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2005-04-28 | — | — | US | claimed |
| US-6844953-B2 | Micro-mirror device including dielectrophoretic liquid | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2005-01-18 | — | — | US | claimed |
| US-20040179281-A1 | Micro-mirror device including dielectrophoretic liquid | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMTED (TW) | 2004-09-16 | — | — | US | claimed |
| EP-1457802-A1 | Micro-mirror device including dielectrophoretic liquid | Hewlett-Packard Development Company, L.P. (US) | 2004-09-15 | — | — | EP | claimed |