SCHEMBL2527583

SCHEMBL2527583

C[Si](C)(C)O[Si](C)(C)CCl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL461471 0.86
SCHEMBL4966793 0.85
SCHEMBL23860269 0.80
SCHEMBL7932735 0.78
SCHEMBL2522520 0.73
SCHEMBL31375451 0.73
SCHEMBL3849019 0.73
SCHEMBL1538986 0.73
SCHEMBL1242740 0.73
SCHEMBL860349 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 177 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119192493-B Shrinkage-reducing polycarboxylate superplasticizer and preparation method thereof 广东红球建材科技有限公司 2025-04-11 CN claimed
CN-119192493-A Shrinkage-reducing polycarboxylate superplasticizer and preparation method thereof 广东红球建材科技有限公司 2024-12-27 CN claimed
CN-119040686-A Preparation process of wear-resistant aluminum alloy material for intelligent watch 海安宏宇合金材料有限公司 2024-11-29 CN claimed
CN-118878826-A Preparation method of reactive temperature-resistant hyperbranched organic silicon resin containing chlorinated hydrocarbon groups 南京大学 2024-11-01 CN claimed
CN-116655917-A Preparation method of methyl hydrogen-containing silicone oil 宜昌泽美新材料有限公司 2023-08-29 CN claimed
CN-116622063-A Modified poly (m-phenylene isophthalamide) and preparation method and application thereof 安徽元琛环保科技股份有限公司 2023-08-22 CN claimed
CN-107235996-A A kind of preparation method and application of trimethyl silicane alkoxide 壮铭新材料科技江苏有限公司 2017-10-10 CN claimed
US-8039049-B2 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2011-10-18 US claimed
US-7405168-B2 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMITED (JP) 2008-07-29 US claimed
US-20080076262-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2008-03-27 US claimed
US-7345000-B2 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2008-03-18 US claimed
WO-2007040816-A2 TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040856-A2 PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040834-A2 PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
US-20070077782-A1 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077353-A1 Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077781-A1 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMTED (JP) 2007-04-05 US claimed
WO-2006091264-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2006-08-31 WO claimed
US-20050215072-A1 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2005-09-29 US claimed
EP-0649887-A2 Water-repellant and antiseptic coating composition DOW CORNING ASIA, Ltd. (JP) 1995-04-26 EP claimed