Monomethyl Fumarate

Monomethyl Fumarate

SCHEMBL25280962

COC(=O)/C=C\C(=O)O.O=C(O)/C=C\C(=O)O

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

KEAP1

The experimentally established mechanism targets of Monomethyl Fumarate. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KEAP1 known ✓ Q14145 1/20 0.77
HCAR2 Q8TDS4 10/20 1.00
NFE2L2 Q16236 1/20 0.77
ALDH1A1 P00352 4/20 0.63
MAPT P10636 2/20 0.63
KDM4E B2RXH2 1/20 0.63
TDP1 Q9NUW8 1/20 0.63
ALOX15 P16050 1/20 0.59
RECQL P46063 1/20 0.59
HSD17B10 Q99714 1/20 0.59
TSHR P16473 2/20 0.53
TP53 P04637 1/20 0.53
EGLN1 Q9GZT9 1/20 0.53
EGLN3 Q9H6Z9 1/20 0.53
GFPT1 Q06210 1/20 0.44
GAA P10253 1/20 0.42
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
TYR P14679 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Dimethyl Maleate SCHEMBL28037663 1.00 HCAR2 (1.00) HCAR2KEAP1NFE2L2ALDH1A1MAPT
Monomethyl Fumarate SCHEMBL60132 1.00
Dimethyl Maleate SCHEMBL19690393 1.00 HCAR2 (1.00) HCAR2KEAP1NFE2L2ALDH1A1MAPT
Monomethyl Fumarate SCHEMBL28468249 1.00 HCAR2 (1.00) HCAR2KEAP1NFE2L2ALDH1A1MAPT
Dimethyl Fumarate SCHEMBL15573962 1.00 HCAR2 (1.00) HCAR2KEAP1NFE2L2ALDH1A1MAPT
Monomethyl Fumarate SCHEMBL126468 1.00
Dimethyl Fumarate SCHEMBL15573963 1.00 HCAR2 (1.00) HCAR2KEAP1NFE2L2ALDH1A1MAPT
Monomethyl Fumarate SCHEMBL60133 1.00
Dimethyl Maleate SCHEMBL6896824 1.00 HCAR2 (1.00) HCAR2KEAP1NFE2L2ALDH1A1MAPT
Dimethyl Fumarate SCHEMBL28295894 1.00 HCAR2 (1.00) HCAR2KEAP1NFE2L2ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4201681-B1 INKJET RECORDING METHOD AND INKJET RECORDING DEVICE KONICA MINOLTA INC (JP) 2025-12-10 EP disclosed
EP-4201681-A1 INKJET RECORDING METHOD AND INKJET RECORDING DEVICE KONICA MINOLTA, INC. (JP) 2023-06-28 EP disclosed
CN-116135893-A Alkali-soluble resin, alkali-soluble resin composition, photo-curing composition and photo-curing product 常州强力电子新材料股份有限公司 2023-05-19 CN disclosed
CN-115304485-A Oil product antirust additive, preparation method thereof and oil product composition 中国石油化工股份有限公司 2022-11-08 CN disclosed
CN-103838084-A Photosensitive resin composition SUMITOMO CHEMICAL CO 2014-06-04 CN disclosed
CN-103676480-A Photosensitive resin composition SUMITOMO CHEMICAL CO 2014-03-26 CN disclosed
CN-103376659-A Photosensitive resin composition SUMITOMO CHEMICAL CO 2013-10-30 CN disclosed
CN-102749807-A Photosensitive resin composition SUMITOMO CHEMICAL CO 2012-10-24 CN disclosed
CN-102650829-A Coloring cured resin composite SUMITOMO CO LTD 2012-08-29 CN disclosed
CN-102566271-A Photosensitive resin composition SUMITOMO CO LTD 2012-07-11 CN disclosed
CN-102486610-A Coloring photosensitive resin composition SUMITOMO CO LTD 2012-06-06 CN disclosed
CN-102445844-A Colored photosensitive resin composition SUMITOMO CHEMICAL CO 2012-05-09 CN disclosed
CN-102445851-A Colored photosensitive composition SUMITOMO CHEMICAL CO 2012-05-09 CN disclosed
CN-102375337-A Photosensitive resin composition SUMITOMO CHEMICAL CO 2012-03-14 CN disclosed