SCHEMBL2531995

SCHEMBL2531995

CCC1CCC([O])CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2150283 0.83 ALDH1A1 (0.37)
SCHEMBL43433 0.83
SCHEMBL2222242 0.83 ALDH1A1 (0.37)
SCHEMBL32667642 0.83 ALDH1A1 (0.37)
Ammonia Solution, Strong SCHEMBL145222 0.79
Bromide SCHEMBL497961 0.79
SCHEMBL27656149 0.79
Hydrogen Sulfide SCHEMBL5675254 0.79
SCHEMBL27889756 0.79
Ethane SCHEMBL8844665 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2394980-B1 AROMATIC AMINO COMPOUND MANUFACTURING METHOD HODOGAYA CHEMICAL CO LTD (JP) 2016-12-21 EP disclosed
US-9238624-B2 Method of producing aromatic amino compounds HODOGAYA CHEMICAL CO., LTD. (JP) 2016-01-19 US disclosed
US-20140163232-A1 METHOD OF PRODUCING AROMATIC AMINO COMPOUNDS HODOGAYA CHEMICAL CO., LTD. (JP) 2014-06-12 US disclosed
US-8735626-B2 Method of producing aromatic amino compounds HODOGAYA CHEMICAL CO., LTD. (JP) 2014-05-27 US disclosed
EP-2394980-A1 AROMATIC AMINO COMPOUND MANUFACTURING METHOD Hodogaya Chemical Co., Ltd. (JP) 2011-12-14 EP disclosed
CN-102239133-A Aromatic amino compound manufacturing method HODOGAYA CHEMICAL CO LTD 2011-11-09 CN disclosed
US-20110257404-A1 METHOD OF PRODUCING AROMATIC AMINO COMPOUNDS HODOGAYA CHEMICAL CO., LTD. (JP) 2011-10-20 US disclosed
CN-101065364-A Novel pyrimidine derivatives and their use as PPAR-alpha modulators BAYER HEALTHCARE AG (DE) 2007-10-31 CN disclosed
US-20070231654-A1 Process of producing sulfonic group-containing substituted polyacetylene membrane, membrane obtained thereby and application thereof EBARA CORPORATION (JP) 2007-10-04 US disclosed
EP-1046957-B1 Photosensitive resin composition JSR CORP (JP) 2004-07-28 EP disclosed
US-6280905-B1 LIGHT SENSITIVE ELEMENT WITH COPOLYMER OF ALAPHATIC CONJUGATED DIENE AND UNSATURATED AMINO COMPOUNDS JSR CORPORATION (JP) 2001-08-28 US disclosed
EP-1046957-A1 Photosensitive resin composition JSR Corporation (JP) 2000-10-25 EP disclosed