Formic Acid

Formic Acid

SCHEMBL2533294

CCCCCCCCCC[N+](C)(C)C.O=CO

nearest known ligand 0.71

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 9/20 0.71
APAF1 O14727 1/20 0.65
HSP90AA1 P07900 1/20 0.65
RAD52 P43351 1/20 0.65
MEN1 O00255 4/20 0.52
KMT2A Q03164 4/20 0.52
APEX1 P27695 3/20 0.52
NFKB1 P19838 2/20 0.52
KDM4E B2RXH2 2/20 0.52
ACHE P22303 2/20 0.52
SMN1; SMN2 Q16637 2/20 0.52
PMP22 Q01453 2/20 0.52
LMNA P02545 2/20 0.52
HSD17B10 Q99714 1/20 0.52
HRH3 Q9Y5N1 1/20 0.52
TSHR P16473 1/20 0.52
RAB9A P51151 1/20 0.52
NPSR1 Q6W5P4 1/20 0.50
HTT P42858 1/20 0.50
SLC22A1 O15245 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cetrimonium SCHEMBL4817929 1.00 DNM1 (0.71) DNM1APAF1HSP90AA1RAD52MEN1
Formic Acid SCHEMBL5573609 1.00 DNM1 (0.71) DNM1APAF1HSP90AA1RAD52MEN1
Formic Acid SCHEMBL558269 1.00 DNM1 (0.71) DNM1APAF1HSP90AA1RAD52MEN1
Formic Acid SCHEMBL5570529 1.00 DNM1 (0.71) DNM1APAF1HSP90AA1RAD52MEN1
Formic Acid SCHEMBL5573604 1.00 DNM1 (0.71) DNM1APAF1HSP90AA1RAD52MEN1
Formic Acid SCHEMBL5573546 1.00 DNM1 (0.71) DNM1APAF1HSP90AA1RAD52MEN1
Formic Acid SCHEMBL5574434 0.98 DNM1 (0.67) DNM1APAF1HSP90AA1RAD52MEN1
Formic Acid SCHEMBL5574500 0.90 DNM1 (0.55) DNM1APAF1HSP90AA1RAD52MEN1
Acetic Acid SCHEMBL10357996 0.88 DNM1 (0.56) DNM1APAF1HSP90AA1RAD52MEN1
Acetaldehyde SCHEMBL11414364 0.88 DNM1 (0.75) DNM1APAF1HSP90AA1RAD52MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8575245-B2 Tunable polymer compositions NOVOMER, INC. (US) 2013-11-05 US claimed
US-20110257296-A1 TUNABLE POLYMER COMPOSITIONS NOVOMER, INC. (US) 2011-10-20 US claimed
WO-2010075232-A1 TUNABLE POLYMER COMPOSITIONS NOVOMER, INC. (US) 2010-07-01 WO claimed
US-8575245-B2 Tunable polymer compositions NOVOMER, INC. (US) 2013-11-05 US disclosed
US-20110257296-A1 TUNABLE POLYMER COMPOSITIONS NOVOMER, INC. (US) 2011-10-20 US disclosed
WO-2010075232-A1 TUNABLE POLYMER COMPOSITIONS NOVOMER, INC. (US) 2010-07-01 WO disclosed
US-20070135565-A1 COMPOSITION FOR FORMING POROUS FILM, POROUS FILM AND METHOD FOR FORMING THE SAME, INTERLEVEL INSULATOR FILM, AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2007-06-14 US disclosed
US-7132473-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2006-11-07 US disclosed
EP-1568744-A1 COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-08-31 EP disclosed
US-20040219372-A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 2004-11-04 US disclosed