Hydrochloric Acid

Hydrochloric Acid

SCHEMBL2539245

CC1=Cc2c(C)c(C)c(C)c(C)c2C1[Ti+2](C1C(C)=Cc2c(C)c(C)c(C)c(C)c21)=[Si](C)C.[Cl-].[Cl-]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL2536471 0.67
Hydrochloric Acid SCHEMBL6291746 0.67
Hydrochloric Acid SCHEMBL2538357 0.65
Hexamethylbenzene SCHEMBL3999658 0.44
Hexamethylbenzene SCHEMBL8521012 0.44
Hexamethylbenzene SCHEMBL3999981 0.44
Hexamethylbenzene SCHEMBL114857 0.43 RXFP1 (0.33)
SCHEMBL31499332 0.42
SCHEMBL2864343 0.41
SCHEMBL14518209 0.40

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8044144-B2 Resin composition, transparent film or sheet having elasticity recovering property, and wrap film PRIME POLYMER CO., LTD. (JP) 2011-10-25 US disclosed
US-20090012238-A1 RESIN COMPOSITION, TRANSPARENT FILM OR SHEET HAVING ELASTICITY RECOVERING PROPERTY, AND WRAP FILM PRIME POLYMER CO., LTD (JP) 2009-01-08 US disclosed
US-7259215-B2 Process for producing propylene/ethylene block copolymer and propylene/ethylene block copolymer IDEMITSU KOSAN CO., LTD. (JP) 2007-08-21 US disclosed
US-20060014909-A1 Process for producing propylene/ethylene block copolymer and propylene/ethylene block copolymer IDEMITSU KOSAN CO., LTD. (JP) 2006-01-19 US disclosed
EP-1561762-A1 PROCESS FOR PRODUCING PROPYLENE/ETHYLENE BLOCK COPOLYMER AND PROPYLENE/ETHYLENE BLOCK COPOLYMER IDEMITSU KOSAN COMPANY LIMITED (JP) 2005-08-10 EP disclosed