P-Cresol

P-Cresol

SCHEMBL2539655

Cc1ccc(O)cc1.[Ti]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
P-Cresol SCHEMBL31561350 1.00 ACHE (0.93)
P-Cresol SCHEMBL375 0.96
P-Cresol SCHEMBL11263098 0.96 ACHE (1.00)
P-Xylene SCHEMBL28199191 0.96 ACHE (1.00)
P-Cresol SCHEMBL960690 0.96 ACHE (1.00)
P-Cresol SCHEMBL9726112 0.96 ACHE (1.00)
P-Cresol SCHEMBL8024717 0.93 ACHE (0.93)
P-Cresol SCHEMBL11161367 0.93
P-Cresol SCHEMBL14973612 0.93
P-Cresol SCHEMBL3858549 0.93

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1067690-C Catalyst system for syndiotactic polymerization, its preparing method and use thereof CHINESE ACAD INST CHEMISTRY (CN) 2001-06-27 CN claimed
CN-1191223-A Catalyst system for syndiotactic polymerization, its preparing method and use thereof CHINESE ACAD INST CHEMISTRY (CN) 1998-08-26 CN claimed
CN-110891926-B Oligomerization process using vortexes IFP 新能源公司 2023-08-04 CN disclosed
CN-105372951-B Toner 佳能株式会社 2019-10-18 CN disclosed
CN-105814007-B The method of abradable coating is deposited in the form of polymer gel 通用电气公司 2019-05-07 CN disclosed
CN-105814144-B The method that abradable coating is deposited under polymer gel 通用电气公司 2018-07-06 CN disclosed
CN-105814007-A METHOD OF DEPOSITING ABRADABLE COATINGS UNDER POLYMER GELS 通用电气公司 2016-07-27 CN disclosed
CN-105814144-A Method of depositing abradable coatings under polymer gels 通用电气公司 2016-07-27 CN disclosed
CN-105372951-A Toner CANON KK 2016-03-02 CN disclosed
US-8043535-B2 Enables to form a circuit or the like having good adhesion to a substrate and to form a conductor having high film density and low electric resistance; accurate and fine wiring and electrode by adopting a dispenser coating method and an inkjet printing MITSUI MINING & SMELTING CO., LTD. (JP) 2011-10-25 US disclosed
CN-100335268-C Directly formed image original edition without horizontal printing plate TORAY INDUSTRIES (JP) 2007-09-05 CN disclosed
CN-1524104-A Photoreactive composition ��Ԩ��ѧ��ҵ��ʽ���� 2004-08-25 CN disclosed
CN-1121274-C Metallocene catalyst and its preparing process, application and selective hydrogenation process RES INST OF YANSHAN PETRO CHEM (CN) 2003-09-17 CN disclosed
CN-1440874-A Directly formed image original edition without horizontal printing plate TORAY INDUSTRIES (JP) 2003-09-10 CN disclosed
CN-1373008-A Metallocene catalyst and its preparing process, application and selective hydrogenation process RES INST OF YANSHAN PETRO CHEM (CN) 2002-10-09 CN disclosed
CN-1067690-C Catalyst system for syndiotactic polymerization, its preparing method and use thereof CHINESE ACAD INST CHEMISTRY (CN) 2001-06-27 CN disclosed
CN-1191223-A Catalyst system for syndiotactic polymerization, its preparing method and use thereof CHINESE ACAD INST CHEMISTRY (CN) 1998-08-26 CN disclosed