SCHEMBL2540758

SCHEMBL2540758

C=C(C)C(=O)OC(C)CCC(C)OC(=O)C(=C)C

nearest known ligand 0.50

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.50
ALDH1A1 P00352 2/20 0.44
THRB P10828 1/20 0.38
CHRM2 P08172 2/20 0.35
CHRM4 P08173 2/20 0.35
CHRM1 P11229 2/20 0.35
TBXA2R P21731 1/20 0.35
GALR3 O60755 1/20 0.34
MAPT P10636 1/20 0.34
BLM P54132 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
FAAH O00519 5/20 0.34
CNR1 P21554 1/20 0.33
CNR2 P34972 1/20 0.33
TDP1 Q9NUW8 1/20 0.32
CHRM5 P08912 1/20 0.30
CHRM3 P20309 1/20 0.30
LMNA P02545 1/20 0.30
CYP2C9 P11712 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23494300 0.94 TSHR (0.50) TSHRALDH1A1THRBCHRM2CHRM4
SCHEMBL18927192 0.92 TSHR (0.44) TSHRALDH1A1THRBCHRM2CHRM4
SCHEMBL2764335 0.92 TSHR (0.44) TSHRALDH1A1THRBCHRM2CHRM4
SCHEMBL3685378 0.90 TSHR (0.42) TSHRALDH1A1THRBCHRM2CHRM4
SCHEMBL27635138 0.89 TSHR (0.45) TSHRALDH1A1THRBCHRM2CHRM4
SCHEMBL437295 0.89 TSHR (0.45) TSHRALDH1A1THRBCHRM2CHRM4
SCHEMBL28572398 0.89 FAAH (0.46) TSHRALDH1A1THRBCHRM2CHRM4
SCHEMBL744318 0.89 TSHR (0.45) TSHRALDH1A1THRBCHRM2CHRM4
SCHEMBL23494310 0.88 TSHR (0.41) TSHRALDH1A1THRBFAAHCNR1
SCHEMBL6824352 0.87 TSHR (0.44) TSHRALDH1A1THRBCHRM2CHRM4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220386719-A1 DISPOSABLE VINYL ACETATE ETHYLENE GLOVE Twolink Sdn Bhd (MY) 2022-12-08 US claimed
US-8044138-B2 Carboxylic acid-modified nitrile copolymer latex and latex composition for dip forming comprising the same LG CHEM, LTD. (KR) 2011-10-25 US claimed
US-20100152365-A1 CARBOXYLIC ACID-MODIFIED NITRILE COPOLYMER LATEX AND LATEX COMPOSITION FOR DIP FORMING COMPRISING THE SAME LG CHEM, LTD. (KR) 2010-06-17 US claimed
CN-1217232-C Monomer for cross-linkage agent containing double bond and photoresist copolymer containing same HYUNDAI ELECTRONICS IND (JP) 2005-08-31 CN claimed
US-6403281-B1 ALKYLENE GLYCOL DI(METH)ACRYLATE OR ALKYLENE GLYCOL DI(2-NORBORNENE-5-CARBOXYLATE) CROSSLINKING MONOMERS; DURABILITY, CONTRAST, RESOLUTION, ADHESION; PHOTOLITHOGRAPHY; SEMICONDUCTORS HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-06-11 US claimed
CN-1285529-A Monomer for cross-linkage agent containing double bond and photoresist copolymer containing same HYUNDAI ELECTRONICS IND (JP) 2001-02-28 CN claimed
US-20250155808-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN ZEON CORPORATION (JP) 2025-05-15 US disclosed
WO-2024143072-A1 COMPOSITION AND CURED PRODUCT 株式会社ADEKA 2024-07-04 WO disclosed
WO-2024070672-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 日本ゼオン株式会社 2024-04-04 WO disclosed
WO-2023189969-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 日本ゼオン株式会社 2023-10-05 WO disclosed
EP-3932906-B1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, AND CURED OBJECT ADEKA CORP (JP) 2023-07-12 EP disclosed
US-11667609-B2 Compound, composition containing said compound, self-healing material, surface coating agent, paint, adhesive, material for battery and cured product ADEKA CORPORATION (JP) 2023-06-06 US disclosed
CN-113544120-B Novel compound, composition containing same, self-repairing material, surface coating agent, paint, adhesive, battery material, and cured product 株式会社ADEKA 2023-05-02 CN disclosed
EP-3932906-A1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, AND CURED OBJECT ADEKA CORPORATION (JP) 2022-01-05 EP disclosed
CN-113544120-A Novel compound, composition containing same, and cured product 株式会社ADEKA 2021-10-22 CN disclosed
US-8044138-B2 Carboxylic acid-modified nitrile copolymer latex and latex composition for dip forming comprising the same LG CHEM, LTD. (KR) 2011-10-25 US disclosed
US-20100152365-A1 CARBOXYLIC ACID-MODIFIED NITRILE COPOLYMER LATEX AND LATEX COMPOSITION FOR DIP FORMING COMPRISING THE SAME LG CHEM, LTD. (KR) 2010-06-17 US disclosed
CN-1217232-C Monomer for cross-linkage agent containing double bond and photoresist copolymer containing same HYUNDAI ELECTRONICS IND (JP) 2005-08-31 CN disclosed
US-6403281-B1 ALKYLENE GLYCOL DI(METH)ACRYLATE OR ALKYLENE GLYCOL DI(2-NORBORNENE-5-CARBOXYLATE) CROSSLINKING MONOMERS; DURABILITY, CONTRAST, RESOLUTION, ADHESION; PHOTOLITHOGRAPHY; SEMICONDUCTORS HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-06-11 US disclosed
CN-1285529-A Monomer for cross-linkage agent containing double bond and photoresist copolymer containing same HYUNDAI ELECTRONICS IND (JP) 2001-02-28 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11667609-B2 Compound, composition containing said compound, self-healing material, surface coating agent, paint, adhesive, material for battery and cured product H1-0, H1-10, RAD51 TSHR 4534/4885ALDH1A1 323/4885THRB 3173/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.