SCHEMBL25420071

SCHEMBL25420071

Oc1ccc(O)c(-c2c(F)c(F)c(O)c(F)c2F)c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TTR P02766 1/20 0.42
▸ ALDH1A1 P00352 3/20 0.40
▸ HTT P42858 3/20 0.40
▸ GAA P10253 2/20 0.40
▸ MAPT P10636 2/20 0.40
▸ HPGD P15428 2/20 0.40
▸ RUNX1 Q01196 2/20 0.40
▸ CBFB Q13951 2/20 0.40
▸ GFER P55789 1/20 0.40
▸ NPC1 O15118 1/20 0.40
▸ ESR1 P03372 6/20 0.36
▸ ESR2 Q92731 5/20 0.36
▸ TYR P14679 2/20 0.35
▸ MAOB P27338 2/20 0.35
▸ MAOA P21397 1/20 0.35
▸ UGT1A1 P22309 1/20 0.35
▸ KDM6B O15054 1/20 0.34
▸ KDM6A O15550 1/20 0.34
▸ GUSB P08236 1/20 0.34
▸ ALOX5 P09917 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25422634 0.96 TTR (0.40) TTRALDH1A1HTTGAAMAPT
SCHEMBL25421166 0.94 TTR (0.41) TTRALDH1A1HTTGAAMAPT
SCHEMBL25422120 0.92 TTR (0.42) TTRALDH1A1HTTGAAMAPT
SCHEMBL29001442 0.91 ALDH1A1 (0.42) TTRALDH1A1HTTGAAMAPT
SCHEMBL30310822 0.91 ALDH1A1 (0.42) TTRALDH1A1HTTGAAMAPT
SCHEMBL25422630 0.90 TTR (0.41) TTRALDH1A1HTTGAAMAPT
SCHEMBL25421279 0.90 TTR (0.41) TTRALDH1A1HTTGAAMAPT
SCHEMBL25422542 0.88 TTR (0.40) TTRALDH1A1HTTGAAMAPT
SCHEMBL25420185 0.88 TTR (0.42) TTRALDH1A1HTTGAAMAPT
SCHEMBL5949236 0.83 ESR1 (0.38) TTRESR1ESR2MAOBMAOA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240122065-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN TOSOH CORPORATION (JP) 2024-04-11 — — US disclosed
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 — — EP disclosed
CN-116157382-A Material for metal patterning, amine compound, electronic device, and method for forming metal pattern 东曹株式会社 2023-05-23 — — CN disclosed
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