⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11897699 | 0.79 | — | — | |
| SCHEMBL11897768 | 0.73 | CA1 (0.32) | — | |
| SCHEMBL11897701 | 0.73 | CA2 (0.32) | — | |
| SCHEMBL1699124 | 0.71 | — | — | |
| SCHEMBL11497046 | 0.71 | — | — | |
| SCHEMBL11573542 | 0.71 | POLB (0.42) | — | |
| SCHEMBL65750 | 0.69 | CA1 (0.41) | — | |
| SCHEMBL11898015 | 0.69 | CA2 (0.38) | — | |
| SCHEMBL428997 | 0.69 | — | — | |
| SCHEMBL770043 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8524941-B2 | Process for producing monomer for fluorinated resist | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-09-03 | — | — | US | disclosed |
| US-20120004444-A1 | Process for Producing Monomer for Fluorinated Resist | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-01-05 | — | — | US | disclosed |