Methacrylic Acid

Methacrylic Acid

SCHEMBL25435014

C=C(C)C(=O)O.C=C(C)C(=O)OCC(OC1=CCCC1)OC1=CCCC1

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.41
ALDH1A1 P00352 1/20 0.31
POLB P06746 1/20 0.31
APEX1 P27695 1/20 0.31
HTT P42858 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL128997 0.96 TSHR (0.44) TSHRALDH1A1POLBAPEX1HTT
Acrylic Acid SCHEMBL8676132 0.91 TSHR (0.38) TSHR
SCHEMBL29549904 0.90 TSHR (0.35) TSHR
Acrylic Acid Methyl Ester SCHEMBL27478060 0.86 TSHR (0.35) TSHR
Acrylic Acid Methyl Ester SCHEMBL28091160 0.85 TSHR (0.33) TSHR
SCHEMBL11573487 0.85 THRB (0.43) TSHRALDH1A1POLBAPEX1HTT
SCHEMBL25435012 0.84 TSHR (0.33) TSHR
SCHEMBL29226902 0.83
SCHEMBL7613110 0.83 POLB (0.36) TSHRALDH1A1POLBAPEX1HTT
SCHEMBL6826961 0.82 GSTP1 (0.33) TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 308 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105694385-B A kind of raising polycondensation physical performance and the master batch of melt strength and preparation method thereof 上海富元塑胶科技有限公司 2018-11-23 CN claimed
CN-103713469-B Photosensitive resin composition for color filter and use thereof 奇美实业股份有限公司 2018-02-13 CN claimed
CN-106536645-A Clear ink composition for UV-LED curable inkjet printing 阪田油墨株式会社 2017-03-22 CN claimed
CN-105694385-A Master batch capable of enhancing properties and melt strength of condensation polymer and preparation method thereof 上海富元塑胶科技有限公司 2016-06-22 CN claimed
CN-105693915-A Reactive extrusion co-polymerization method for vinyl monomers 华东理工大学 2016-06-22 CN claimed
CN-103732689-B Light-cured type organic inorganic hybridization resin combination DONGJIN SEMICHEM CO.,LTD. (KR) 2016-05-18 CN claimed
CN-103360977-B Adhesive tape and solar cell module using the same HITACHI CHEMICAL CO LTD 2015-07-22 CN claimed
CN-101508846-B Organic-inorganic composite resin composition useful as protective film DONGJIN SEMICHEM CO LTD 2015-05-13 CN claimed
CN-103146105-B Reaction extrusion polymerization method of functional acrylate resin UNIV EAST CHINA SCIENCE & TECH 2015-04-29 CN claimed
CN-102736411-B Photosensitive resin composition, and color filter and liquid crystal display device using same CHI MEI CORP. (CN) 2014-10-15 CN claimed
CN-102736411-A Photosensitive resin composition, and color filter and liquid crystal display device using same CHI MEI CORP 2012-10-17 CN claimed
CN-1900821-B Organic-inorganic composite photosensitive resin composition DONGJIN SEMICOHEM CO LTD 2011-08-31 CN claimed
CN-101501769-B Ultraviolet hardening composition for optical disk interlayer, optical disk and process for producing optical disk DAINIPPON INK & CHEMICALS KK 2010-12-08 CN claimed
CN-1707358-B Photosensitive resin composition SUMITOMO CHEMICAL CO 2010-09-01 CN claimed
CN-101501769-A Ultraviolet hardening composition for optical disk interlayer, optical disk and process for producing optical disk DAINIPPON INK & CHEMICALS (JP) 2009-08-05 CN claimed
CN-101261445-A Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib SAMSUNG SDI CO LTD (KR) 2008-09-10 CN claimed
CN-1955843-A Photonasty resin compositon DONGJIN SIMIKEN CO LTD (KR) 2007-05-02 CN claimed
CN-1900821-A Organic inorganic composite photosensitive resin composition DONGJIN SEMICHEM CO LTD (KR) 2007-01-24 CN claimed
CN-1873534-A Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same SAMSUNG ELECTRONICS CO LTD (KR) 2006-12-06 CN claimed
CN-1707358-A Photosensitive resin composition SUMITOMO CHEMICAL CO (JP) 2005-12-14 CN claimed