SCHEMBL2544205

SCHEMBL2544205

C=C(C)C(=O)OC(C)CC(C)OC(=O)C(=C)C

nearest known ligand 0.50

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.50
ALDH1A1 P00352 2/20 0.44
THRB P10828 1/20 0.38
CHRM2 P08172 2/20 0.35
CHRM4 P08173 2/20 0.35
CHRM1 P11229 2/20 0.35
TBXA2R P21731 1/20 0.35
GALR3 O60755 1/20 0.34
MAPT P10636 1/20 0.34
BLM P54132 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
TDP1 Q9NUW8 1/20 0.32
CYP19A1 P11511 1/20 0.31
CHRM5 P08912 1/20 0.30
CHRM3 P20309 1/20 0.30
LMNA P02545 1/20 0.30
CYP2C9 P11712 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2013862 0.93 TSHR (0.54) TSHRALDH1A1THRBCHRM2CHRM4
SCHEMBL4275495 0.89 TSHR (0.45) TSHRALDH1A1THRBCHRM2CHRM4
SCHEMBL18159067 0.88 TSHR (0.41) TSHRALDH1A1THRB
SCHEMBL23494020 0.87 TSHR (0.44) TSHRALDH1A1THRBCHRM2CHRM4
SCHEMBL27518855 0.87 TSHR (0.44) TSHRALDH1A1THRBCHRM2CHRM4
SCHEMBL2540758 0.86 TSHR (0.50) TSHRALDH1A1THRBCHRM2CHRM4
SCHEMBL23494095 0.86 TSHR (0.42) TSHRALDH1A1THRBCHRM2CHRM4
SCHEMBL9388215 0.84 TSHR (0.41) TSHRALDH1A1THRB
SCHEMBL30532278 0.84 TSHR (0.41) TSHRALDH1A1THRB
SCHEMBL27785078 0.84 TSHR (0.41) TSHRALDH1A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220386719-A1 DISPOSABLE VINYL ACETATE ETHYLENE GLOVE Twolink Sdn Bhd (MY) 2022-12-08 US claimed
US-8044138-B2 Carboxylic acid-modified nitrile copolymer latex and latex composition for dip forming comprising the same LG CHEM, LTD. (KR) 2011-10-25 US claimed
CN-101747542-A Carboxylic acid-modified nitrile copolymer latex and latex composition for dip forming comprising the same LG CHEMICAL LTD 2010-06-23 CN claimed
US-20100152365-A1 CARBOXYLIC ACID-MODIFIED NITRILE COPOLYMER LATEX AND LATEX COMPOSITION FOR DIP FORMING COMPRISING THE SAME LG CHEM, LTD. (KR) 2010-06-17 US claimed
US-6403281-B1 ALKYLENE GLYCOL DI(METH)ACRYLATE OR ALKYLENE GLYCOL DI(2-NORBORNENE-5-CARBOXYLATE) CROSSLINKING MONOMERS; DURABILITY, CONTRAST, RESOLUTION, ADHESION; PHOTOLITHOGRAPHY; SEMICONDUCTORS HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-06-11 US claimed
US-20220386719-A1 DISPOSABLE VINYL ACETATE ETHYLENE GLOVE Twolink Sdn Bhd (MY) 2022-12-08 US disclosed
CN-106662820-B Composition for forming silicon-containing resist underlayer film having halosulfonylalkyl group 日产化学工业株式会社 2021-06-22 CN disclosed
US-8044138-B2 Carboxylic acid-modified nitrile copolymer latex and latex composition for dip forming comprising the same LG CHEM, LTD. (KR) 2011-10-25 US disclosed
CN-101747542-A Carboxylic acid-modified nitrile copolymer latex and latex composition for dip forming comprising the same LG CHEMICAL LTD 2010-06-23 CN disclosed
US-20100152365-A1 CARBOXYLIC ACID-MODIFIED NITRILE COPOLYMER LATEX AND LATEX COMPOSITION FOR DIP FORMING COMPRISING THE SAME LG CHEM, LTD. (KR) 2010-06-17 US disclosed
US-6403281-B1 ALKYLENE GLYCOL DI(METH)ACRYLATE OR ALKYLENE GLYCOL DI(2-NORBORNENE-5-CARBOXYLATE) CROSSLINKING MONOMERS; DURABILITY, CONTRAST, RESOLUTION, ADHESION; PHOTOLITHOGRAPHY; SEMICONDUCTORS HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-06-11 US disclosed