SCHEMBL25468243

SCHEMBL25468243

CCC(C)C(=O)OC1(C(C)(C)C)CCOC1

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.32
APEX1 P27695 1/20 0.32
KMT2A Q03164 1/20 0.32
ATM Q13315 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18176984 0.91 CYP3A4 (0.33) POLBAPEX1KMT2AATM
SCHEMBL18177003 0.82 CYP3A4 (0.32) KMT2A
SCHEMBL8738379 0.80
SCHEMBL18176985 0.78 ABCB11 (0.30)
SCHEMBL6367138 0.78 ABCB11 (0.30)
SCHEMBL12902886 0.77 CYP3A4 (0.31) POLBAPEX1KMT2AATM
SCHEMBL12902881 0.76 CYP3A4 (0.31) POLBAPEX1KMT2AATM
SCHEMBL12902882 0.76 CYP3A4 (0.31) POLBAPEX1KMT2AATM
SCHEMBL18176983 0.76
SCHEMBL6367378 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230148344-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND FUJIFILM CORPORATION (JP) 2023-05-11 US disclosed