SCHEMBL25470592

SCHEMBL25470592

CC(C)(C)OC(=O)CSc1ccc([SH](c2ccc(SCC(=O)OC(C)(C)C)cc2)c2ccc(SCC(=O)OC(C)(C)C)cc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.41
CCNB2 O95067 1/20 0.40
CCNE2 O96020 1/20 0.40
CDK1 P06493 1/20 0.40
CDK4 P11802 1/20 0.40
CCNB1 P14635 1/20 0.40
CCND1 P24385 1/20 0.40
CCNE1 P24864 1/20 0.40
CDK2 P24941 1/20 0.40
CCNB3 Q8WWL7 1/20 0.40
SMN1; SMN2 Q16637 3/20 0.39
GLA P06280 2/20 0.38
GAA P10253 2/20 0.38
KDM4E B2RXH2 2/20 0.38
MAPT P10636 2/20 0.38
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38
FFAR1 O14842 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25470452 0.94 FFAR1 (0.41) ALDH1A1CCNB2CCNE2CDK1CDK4
SCHEMBL25762882 0.87 PSEN1 (0.41) ALDH1A1CCNB2CCNE2CDK1CDK4
SCHEMBL19386035 0.83 NPC1 (0.47) ALDH1A1SMN1; SMN2GAAMAPTRAB9A
SCHEMBL4597724 0.83 ALDH1A1 (0.44) ALDH1A1CCNB2CCNE2CDK1CDK4
SCHEMBL27416575 0.83 PSEN1 (0.36) ALDH1A1CCNB2CCNE2CDK1CDK4
SCHEMBL6933770 0.82 POLB (0.44) ALDH1A1CCNB2CCNE2CDK1CDK4
SCHEMBL7049482 0.82 SMN1; SMN2 (0.54) ALDH1A1CCNB2CCNE2CDK1CDK4
SCHEMBL19403484 0.82 HPGD (0.48) ALDH1A1SMN1; SMN2MAPTRAB9AMEN1
SCHEMBL3892024 0.82 ALDH1A1 (0.46) ALDH1A1CCNB2CCNE2CDK1CDK4
SCHEMBL7867128 0.81 FFAR1 (0.55) ALDH1A1CCNB2CCNE2CDK1CDK4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230221640-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-07-13 US disclosed
US-20230148344-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND FUJIFILM CORPORATION (JP) 2023-05-11 US disclosed
US-20230139009-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-05-04 US disclosed